A beamline for micromachining and micro-characterization at the APS
- Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois60439 (United States)
Beamline 2-BM at the Advanced Photon Source had been designed for developing micromachining techniques based on deep x-ray lithography and also for micro-characterization of optics and samples. With a critical energy of 19.5 keV and a highly collimated beam, the APS bending-magnet source is well suited for fabricating thick photoresist structures ({gt}1 mm) with high precision. The 2-BM beamline was designed to exploit these source characteristics and to provide flexible spectral tuning in order to accommodate different mask/resist thicknesses and to study the effects of the x-ray energy on the lithography process. The beamline will also be used for developing micro-characterization techniques. This includes characterization of microfocusing optics such as zone plates and developing instrumentation for techniques such as x-ray microprobe and microtomography. For this purpose, two monochromators, one using crystals and one using multilayers, will be used to cover the 1-35 keV regime with different energy bandwidths. Beamline design, end-station layout, and recent results will be presented.{copyright} {ital 1997 American Institute of Physics.}
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-31109-ENG-38
- OSTI ID:
- 627876
- Report Number(s):
- CONF-9706157-; ISSN 0094-243X; TRN: 98:006217
- Journal Information:
- AIP Conference Proceedings, Vol. 417, Issue 1; Conference: SRI `97: 10. U.S. national conference on synchrotron radiation instrumentation, Ithaca, NY (United States), 17-20 Jun 1997; Other Information: PBD: Jul 1997
- Country of Publication:
- United States
- Language:
- English
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