Generation and applications of finely focused low energy electron beams

Thesis/Dissertation · Sun Jan 01 00:00:00 EST 1984

OSTI ID:6248895

Yau, Y W

Submicron diameter beams of low energy (5 keV or less) electrons are desirable for a number of applications such as high resolution lithography with negligible proximity effects and selective surface heating of targets. Focusing low energy electrons in conventional electron beam systems is usually hampered by chromatic aberration and spherical aberration of the final lens and by electron-electron interactions since the electrons are slower. An alternative approach is to accelerate the electrons to a high potential (e.g. 20 kV) initially and then reduce the potential only near the target. Two configurations were investigated numerically and experimentally. Such retarding field configurations have the advantages of much lower aberrations and reduced electron-electron interactions, thus facilitating the production of low energy electron beams without seriously sacrificing current density. With such finely focused low energy electron beams, the power dissipated per unit volume near the surface of the bulk target is higher because of the larger scattering cross-section of the lower energy electrons. This increases the speed (in square centimeter per Coulomb) of exposure of (thin) resists and renders proximity and heating effects negligible. Furthermore, the lower energy particles cause less damage to underlying semiconductor structures.

• Research Organization: Stanford Univ., CA (USA)
• OSTI ID: 6248895
• Resource Relation: Other Information: Thesis (Ph. D.)
• Country of Publication: United States
• Language: English

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