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Title: Structural and chemisorptive properties of model catalysts: Copper supported on SiO[sub 2] thin films

Journal Article · · Journal of Physical Chemistry; (United States)
OSTI ID:6202091
;  [1]
  1. Texas A M Univ., College Station (United States)

The structural and chemical properties of model silica-supported copper catalysts have been investigated with infrared reflection-absorption spectroscopy and temperature-programmed desorption using CO as a probe molecule. The isosteric heats of adsorption of carbon monoxide on the model catalysts were measured at pressures between 10[sup [minus]8] and 10[sup [minus]3] Torr and temperatures between 180 and 300 K. The model catalysts were prepared by evaporating copper onto a planar silica thin film ([approximately]100 [Angstrom]) which, in turn, was supported on a Mo(110) surface. When deposited at 100 K, copper initially forms a two-dimensional structure on silica; however, annealing induces the ultrathin copper films (< 3 ML) to form small clusters. The unannealed copper films have a significant density of low-coordinated copper sites, whereas the annealed films consist of copper clusters with structures similar to low-index [(111), (110)] and high-index copper planes [(211) or (311)]. The distribution of the facets depends upon the initial copper coverage. The dispersion of the copper on the planar silica films is high, [approximately]0.5, for the annealed films with [theta][sub Cu] < 2 ML. Carbon monoxide desorbs in a single peak centered at [approximately]210 K from the unannealed copper film, but in several peaks centered between 150 and 220 K from the annealed film. The CO adsorption energy strongly depends on the CO coverage, varying, from [approximately]17 kcal/mol at the low coverage limit to [approximately]10 kcal/mol near CO saturation. 38 refs., 12 figs., 1 tab.

OSTI ID:
6202091
Journal Information:
Journal of Physical Chemistry; (United States), Vol. 97:3; ISSN 0022-3654
Country of Publication:
United States
Language:
English