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Title: Influence of target[endash]substrate angle on the elemental concentration of [ital c]-axis YBa[sub 2]Cu[sub 3]O[sub 7[minus]x] thin films

Abstract

The thermalization processes in sputtering suggest a spatial dependence of elemental concentration in the sputter plume. A variety of analysis techniques demonstrate that [ital c]-axis films grown at angles which deviate from the standard off-axis geometry produce nominally YBa[sub 2]Cu[sub 3]O[sub 7[minus]x] in the bulk with dramatic changes in the surface morphology and deposition rate. In addition to the common materials characterization techniques of scanning electron microscopy, x-ray diffraction, transport measurements, and conventional Rutherford backscattering spectrometry (RBS), angle-dependent RBS is employed to probe surface inhomogeneities of films grown at target[endash]substrate angles away from the standard off-axis position. [copyright] [ital 1999 American Institute of Physics.]

Authors:
;  [1]
  1. (Department of Physics and Materials Research Laboratory, University of Illinois Urbana-Champaign, Urbana, Illinois 61801 (United States))
Publication Date:
OSTI Identifier:
6196136
Alternate Identifier(s):
OSTI ID: 6196136
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 75:11; Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; BARIUM COMPOUNDS; BARIUM OXIDES; COPPER OXIDES; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; HIGH-TC SUPERCONDUCTORS; RUTHERFORD SCATTERING; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; SUPERCONDUCTING FILMS; X-RAY DIFFRACTION; YTTRIUM COMPOUNDS; YTTRIUM OXIDES; ALKALINE EARTH METAL COMPOUNDS; CHALCOGENIDES; COHERENT SCATTERING; COPPER COMPOUNDS; DIFFRACTION; ELASTIC SCATTERING; ELECTRICAL PROPERTIES; ELECTRON MICROSCOPY; FILMS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; SCATTERING; SUPERCONDUCTORS; TRANSITION ELEMENT COMPOUNDS; TYPE-II SUPERCONDUCTORS 360202* -- Ceramics, Cermets, & Refractories-- Structure & Phase Studies

Citation Formats

Pugel, D.E., and Greene, L.H. Influence of target[endash]substrate angle on the elemental concentration of [ital c]-axis YBa[sub 2]Cu[sub 3]O[sub 7[minus]x] thin films. United States: N. p., 1999. Web. doi:10.1063/1.124763.
Pugel, D.E., & Greene, L.H. Influence of target[endash]substrate angle on the elemental concentration of [ital c]-axis YBa[sub 2]Cu[sub 3]O[sub 7[minus]x] thin films. United States. doi:10.1063/1.124763.
Pugel, D.E., and Greene, L.H. Wed . "Influence of target[endash]substrate angle on the elemental concentration of [ital c]-axis YBa[sub 2]Cu[sub 3]O[sub 7[minus]x] thin films". United States. doi:10.1063/1.124763.
@article{osti_6196136,
title = {Influence of target[endash]substrate angle on the elemental concentration of [ital c]-axis YBa[sub 2]Cu[sub 3]O[sub 7[minus]x] thin films},
author = {Pugel, D.E. and Greene, L.H.},
abstractNote = {The thermalization processes in sputtering suggest a spatial dependence of elemental concentration in the sputter plume. A variety of analysis techniques demonstrate that [ital c]-axis films grown at angles which deviate from the standard off-axis geometry produce nominally YBa[sub 2]Cu[sub 3]O[sub 7[minus]x] in the bulk with dramatic changes in the surface morphology and deposition rate. In addition to the common materials characterization techniques of scanning electron microscopy, x-ray diffraction, transport measurements, and conventional Rutherford backscattering spectrometry (RBS), angle-dependent RBS is employed to probe surface inhomogeneities of films grown at target[endash]substrate angles away from the standard off-axis position. [copyright] [ital 1999 American Institute of Physics.]},
doi = {10.1063/1.124763},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = ,
volume = 75:11,
place = {United States},
year = {1999},
month = {9}
}