Purification of silane via laser-induced chemistry
Patent
·
OSTI ID:6191972
Impurities such as PH/sub 3/, AsH/sub 3/, and B/sub 2/H/sub 6/ may be removed from SiH/sub 4/ by means of selective photolysis with ultraviolet radiation of the appropriate wavelength. An ArF laser operating at 193 nm provides an efficient and effective radiation source for the photolysis.
- Assignee:
- Dept. of Energy
- Patent Number(s):
- US 4146449
- Application Number:
- TRN: 79-017030
- OSTI ID:
- 6191972
- Resource Relation:
- Patent File Date: Filed date 28 Dec 1977; Other Information: PAT-APPL-865,348
- Country of Publication:
- United States
- Language:
- English
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Purification of silane via laser-induced chemistry
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+1 more
Related Subjects
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
SILANES
PURIFICATION
ARSENIC HYDRIDES
BORANES
CHEMICAL LASERS
IMPURITIES
PHOSPHORUS HYDRIDES
PHOTOLYSIS
ARSENIC COMPOUNDS
BORON COMPOUNDS
CHEMICAL REACTIONS
DECOMPOSITION
HYDRIDES
HYDROGEN COMPOUNDS
LASERS
PHOSPHORUS COMPOUNDS
PHOTOCHEMICAL REACTIONS
SILICON COMPOUNDS
400201* - Chemical & Physicochemical Properties
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
SILANES
PURIFICATION
ARSENIC HYDRIDES
BORANES
CHEMICAL LASERS
IMPURITIES
PHOSPHORUS HYDRIDES
PHOTOLYSIS
ARSENIC COMPOUNDS
BORON COMPOUNDS
CHEMICAL REACTIONS
DECOMPOSITION
HYDRIDES
HYDROGEN COMPOUNDS
LASERS
PHOSPHORUS COMPOUNDS
PHOTOCHEMICAL REACTIONS
SILICON COMPOUNDS
400201* - Chemical & Physicochemical Properties