Metallic multilayers at the nanoscale
The development of multilayer structures has been driven by a wide range of commercial applications requiring enhanced material behaviors. Innovations in physical vapor deposition technologies, in particular magnetron sputtering, have enabled the synthesis of metallic-based structures with nanoscaled layer dimensions as small as one-to-two monolayers. Parameters used in the deposition process are paramount to the Formation of these small layer dimensions and the stability of the structure. Therefore, optimization of the desired material properties must be related to assessment of the actual microstructure. Characterization techniques as x-ray diffraction and high resolution microscopy are useful to reveal the interface and layer structure-whether ordered or disordered crystalline, amorphous, compositionally abrupt or graded, and/or lattice strained Techniques for the synthesis of metallic multilayers with subnanometric layers will be reviewed with applications based on enhancing material behaviors as reflectivity and magnetic anisotropy but with emphasis on experimental studies of mechanical properties.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 61708
- Report Number(s):
- UCRL-JC-118972; CONF-941039-5; ON: DE95011534; TRN: 95:004347
- Resource Relation:
- Conference: 2. international conference on nanostructured materials, Stuttgart (Germany), 3-7 Oct 1994; Other Information: PBD: Nov 1994
- Country of Publication:
- United States
- Language:
- English
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