Writing nanometer-scale symbols in gold using the scanning tunneling microscope
Journal Article
·
· Appl. Phys. Lett.; (United States)
The conditions required to electroetch nanometer-sized craters in flat gold substrates with a scanning tunneling microscope operating in air are identified. Reproducible nanometer-scale modifications of the substrate are possible. Letters and complex symbols with linewidths as small as 2 nm have been written. Experiments show that a good tunneling tip is not destroyed by the writing process.
- Research Organization:
- Department of Physics, Purdue University, West Lafayette, Indiana 47907
- OSTI ID:
- 6155018
- Journal Information:
- Appl. Phys. Lett.; (United States), Vol. 54:15
- Country of Publication:
- United States
- Language:
- English
Similar Records
Gold deposition from a scanning tunneling microscope tip
Fabrication of nanometer flat areas onto YBa sub 2 Cu sub 3 O sub 7 minus x thin film surfaces by scanning tunneling microscope
Surface modification in the nanometer range by the scanning tunneling microscope
Journal Article
·
· Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
·
OSTI ID:6155018
+2 more
Fabrication of nanometer flat areas onto YBa sub 2 Cu sub 3 O sub 7 minus x thin film surfaces by scanning tunneling microscope
Journal Article
·
Sun Sep 15 00:00:00 EDT 1991
· Journal of Applied Physics; (United States)
·
OSTI ID:6155018
+1 more
Surface modification in the nanometer range by the scanning tunneling microscope
Journal Article
·
Tue Mar 01 00:00:00 EST 1988
· J. Vac. Sci. Technol., A; (United States)
·
OSTI ID:6155018
+4 more