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Title: Reaction mechanism in both a CHF[sub 3]/O[sub 2]/Ar and CHF[sub 3]/H[sub 2]/Ar radio frequency plasma environment

Abstract

A radio frequency (RF) plasma system used to decompose trifluoromethane (CHF[sub 3] or HFC-23) is demonstrated. The CHF[sub 3] decomposition fractions ([eta]CHF[sub 3]) and mole fractions of detected products in the effluent gas streams of CHF[sub 3]/O[sub 2]/Ar and CHF[sub 3]/H[sub 2]/Ar plasma systems, respectively, have been determined. The effects of four experimental parameters, input power, O[sub 2]/CHF[sub 3] or H[sub 2]/CHF[sub 3] ratio, operational pressure, and the CHF[sub 3] feeding concentration were investigated. The same species detected in the effluent gas streams of both CHF[sub 3]/O[sub 2]/Ar and CHF[sub 3]/H[sub 2]/Ar plasma systems were CH[sub 2]F[sub 2], CF[sub 4], HF, and SiF[sub 4]. However, the CO[sub 2] and COF[sub 2] were detected only in the CHF[sub 3]/O[sub 2]/Ar plasma system and the CH[sub 4], C[sub 2]H[sub 2], and CH[sub 3]F were detected only in the CHF[sub 3]/H[sub 2]/Ar plasma system. The results of a model sensitivity analysis showed that the input power was the most influential parameter for [eta]CHF[sub 3] both in the CHF[sub 3]/O[sub 2]/Ar and CHF[sub 3]/H[sub 2]/Ar plasma systems. Furthermore, the possible reaction pathways were built up and elucidated in this study. The addition of hydrogen for CHF[sub 3] decomposition can produce a significant amount ofmore » HF and the main carbonaceous byproducts were CH[sub 4] and C[sub 2]H[sub 2]. Even though the [eta]CHF[sub 3] in the CHF[sub 3]/H[sub 2]/Ar plasma system is lower than that in the CHF[sub 3]/O[sub 2]/Ar plasma system, but due to the more advantages mentioned above, a hydrogen-based RF plasma system is a better alternative to decompose CHF[sub 3].« less

Authors:
; ; ;  [1]
  1. (National Cheng Kung Univ., Tainan (Taiwan, Province of China))
Publication Date:
OSTI Identifier:
6084000
Resource Type:
Journal Article
Journal Name:
Industrial and Engineering Chemistry Research
Additional Journal Information:
Journal Volume: 38:9; Journal ID: ISSN 0888-5885
Country of Publication:
United States
Language:
English
Subject:
32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION; 54 ENVIRONMENTAL SCIENCES; AIR POLLUTION CONTROL; CHEMICAL REACTION KINETICS; DECOMPOSITION; FIRE EXTINGUISHERS; FLUORINATED ALIPHATIC HYDROCARBONS; HYDROGEN; OXYGEN; OZONE LAYER; PLASMA FURNACES; RF SYSTEMS; SENSITIVITY ANALYSIS; CHEMICAL REACTIONS; CONTROL; ELEMENTS; FURNACES; HALOGENATED ALIPHATIC HYDROCARBONS; KINETICS; LAYERS; NONMETALS; ORGANIC COMPOUNDS; ORGANIC FLUORINE COMPOUNDS; ORGANIC HALOGEN COMPOUNDS; POLLUTION CONTROL; REACTION KINETICS; 320305* - Energy Conservation, Consumption, & Utilization- Industrial & Agricultural Processes- Industrial Waste Management; 540120 - Environment, Atmospheric- Chemicals Monitoring & Transport- (1990-)

Citation Formats

Wang, Y.F., Lee, W.J., Chen, C.Y., and Hsieh, L.T. Reaction mechanism in both a CHF[sub 3]/O[sub 2]/Ar and CHF[sub 3]/H[sub 2]/Ar radio frequency plasma environment. United States: N. p., 1999. Web. doi:10.1021/ie9900519.
Wang, Y.F., Lee, W.J., Chen, C.Y., & Hsieh, L.T. Reaction mechanism in both a CHF[sub 3]/O[sub 2]/Ar and CHF[sub 3]/H[sub 2]/Ar radio frequency plasma environment. United States. doi:10.1021/ie9900519.
Wang, Y.F., Lee, W.J., Chen, C.Y., and Hsieh, L.T. Wed . "Reaction mechanism in both a CHF[sub 3]/O[sub 2]/Ar and CHF[sub 3]/H[sub 2]/Ar radio frequency plasma environment". United States. doi:10.1021/ie9900519.
@article{osti_6084000,
title = {Reaction mechanism in both a CHF[sub 3]/O[sub 2]/Ar and CHF[sub 3]/H[sub 2]/Ar radio frequency plasma environment},
author = {Wang, Y.F. and Lee, W.J. and Chen, C.Y. and Hsieh, L.T.},
abstractNote = {A radio frequency (RF) plasma system used to decompose trifluoromethane (CHF[sub 3] or HFC-23) is demonstrated. The CHF[sub 3] decomposition fractions ([eta]CHF[sub 3]) and mole fractions of detected products in the effluent gas streams of CHF[sub 3]/O[sub 2]/Ar and CHF[sub 3]/H[sub 2]/Ar plasma systems, respectively, have been determined. The effects of four experimental parameters, input power, O[sub 2]/CHF[sub 3] or H[sub 2]/CHF[sub 3] ratio, operational pressure, and the CHF[sub 3] feeding concentration were investigated. The same species detected in the effluent gas streams of both CHF[sub 3]/O[sub 2]/Ar and CHF[sub 3]/H[sub 2]/Ar plasma systems were CH[sub 2]F[sub 2], CF[sub 4], HF, and SiF[sub 4]. However, the CO[sub 2] and COF[sub 2] were detected only in the CHF[sub 3]/O[sub 2]/Ar plasma system and the CH[sub 4], C[sub 2]H[sub 2], and CH[sub 3]F were detected only in the CHF[sub 3]/H[sub 2]/Ar plasma system. The results of a model sensitivity analysis showed that the input power was the most influential parameter for [eta]CHF[sub 3] both in the CHF[sub 3]/O[sub 2]/Ar and CHF[sub 3]/H[sub 2]/Ar plasma systems. Furthermore, the possible reaction pathways were built up and elucidated in this study. The addition of hydrogen for CHF[sub 3] decomposition can produce a significant amount of HF and the main carbonaceous byproducts were CH[sub 4] and C[sub 2]H[sub 2]. Even though the [eta]CHF[sub 3] in the CHF[sub 3]/H[sub 2]/Ar plasma system is lower than that in the CHF[sub 3]/O[sub 2]/Ar plasma system, but due to the more advantages mentioned above, a hydrogen-based RF plasma system is a better alternative to decompose CHF[sub 3].},
doi = {10.1021/ie9900519},
journal = {Industrial and Engineering Chemistry Research},
issn = {0888-5885},
number = ,
volume = 38:9,
place = {United States},
year = {1999},
month = {9}
}