Self-pumping impurity control by in-situ metal deposition

doi:https://doi.org/10.2172/6078289

Title: Self-pumping impurity control by in-situ metal deposition

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Abstract

A system for in-situ removal of helium by trapping in freshly deposited metal surface layers of a limiter or divertor has been studied. The system would trap helium on a limiter front surface, or a divertor plate, at low plasma edge temperatures, or in a limiter slot region, at high edge temperatures. Fresh material, introduced to the plasma and/or scrape-off zone, would be added at a rate of about five times the alpha production rate. The material would be reprocessed periodically, e.g., once year. Possible materials are nickel, vanadium, niobium, and tantalum. Advantages of a self-pumping system are the absence of vacuum ducts and pumps, and the minimization of tritium processing and inventory.

Authors:: Brooks, J N; Mattas, R F

Publication Date:: 1983-05-01

Research Org.:: Argonne National Lab., IL (USA)

OSTI Identifier:: 6078289

Report Number(s):: ANL/FPP/TM-174
ON: DE83014265

DOE Contract Number:: W-31-109-ENG-38

Resource Type:: Technical Report

Country of Publication:: United States

Language:: English

Subject:: 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; DIVERTORS; SURFACE COATING; HELIUM; TRAPPING; LIMITERS; IMPURITIES; NICKEL; NIOBIUM; REMOVAL; SURFACES; TANTALUM; VACUUM SYSTEMS; VANADIUM; DEPOSITION; ELEMENTS; FLUIDS; GASES; METALS; NONMETALS; RARE GASES; TRANSITION ELEMENTS; 700209* - Fusion Power Plant Technology- Component Development & Materials Testing

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                    Brooks, J N, and Mattas, R F. Self-pumping impurity control by in-situ metal deposition.  United States: N. p., 1983. 
        Web.  doi:10.2172/6078289.

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                    Brooks, J N, & Mattas, R F. Self-pumping impurity control by in-situ metal deposition.  United States.  https://doi.org/10.2172/6078289

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                    Brooks, J N, and Mattas, R F. Sun .  
        "Self-pumping impurity control by in-situ metal deposition".  United States.  https://doi.org/10.2172/6078289.  https://www.osti.gov/servlets/purl/6078289.

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@article{osti_6078289,

  title        = {Self-pumping impurity control by in-situ metal deposition},

  author       = {Brooks, J N and Mattas, R F},

  abstractNote = {A system for in-situ removal of helium by trapping in freshly deposited metal surface layers of a limiter or divertor has been studied. The system would trap helium on a limiter front surface, or a divertor plate, at low plasma edge temperatures, or in a limiter slot region, at high edge temperatures. Fresh material, introduced to the plasma and/or scrape-off zone, would be added at a rate of about five times the alpha production rate. The material would be reprocessed periodically, e.g., once year. Possible materials are nickel, vanadium, niobium, and tantalum. Advantages of a self-pumping system are the absence of vacuum ducts and pumps, and the minimization of tritium processing and inventory.},

  doi          = {10.2172/6078289},

  url          = {https://www.osti.gov/biblio/6078289},
  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {1983},

  month        = {5}

}

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