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Title: Mask-less fabrication of A-Si solar cell using laser scribe process

Conference · · Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States)
OSTI ID:6075717

The new practical integration process of amorphous silicon (a-Si) solar cells using laser scribing lithography is presented. A 12-stage series-connected, integrated solar cell having a structure of glass-TCO/PIN/metal electrode was fabricated by two laser scribing steps and one metal masking step, or three laser scribing steps alone. The former cell has 6.4% conversion efficiency under AM1 (100mW/cm/sup 2/) and 7.15% under 500Lx fluorescent lamp (69% effective area on 10cm x 10cm substrate), and the latter has 4.11% conversion efficiency under AM1 (83% effective area on 10cm x 10cm substrate). The scribe process is carried out with YAG laser scriber using Q-switched 1.06 micron wavelength light.

Research Organization:
Semiconductor Energy Laboratory Inc., Tokyo
OSTI ID:
6075717
Report Number(s):
CONF-840561-
Journal Information:
Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States), Conference: 17. IEEE photovoltaic specialists conference, Orlando, FL, USA, 1 May 1984
Country of Publication:
United States
Language:
English