Fabrication of quartz resonators by float polishing
AT-cut crystalline quartz blanks that are polished with conventional techniques generally fracture at much lower tensile-stress levels than the theoretical value. The fractures initiate at microcracks which are present on the surfaces and edges of these blanks, and which are caused by lapping and polishing techniques utilized in their manufacture. To obtain precision quartz frequency standards that can withstand a high-G environment a new polishing technique, float polishing, was employed. Blanks 6.35 mm in diameter and 175 ..mu..m thick were float polished - to a thickness corresponding to an operating frequency of 16 MHz - in two batches using fumed SiO/sub 2/ and colloidal SiO/sub 2/. A third batch was polished to this same frequency using TiO/sub 2/ in the float polishing apparatus. These three batches were then evaluated for surface roughness, parallelism, overall surface and edge quality, and stress-failure threshold. Initial results indicate that the batch that was float polished with colloidal SiO/sub 2/ yielded the most improvement, and on an average the stress-failure threshold for this batch improved by a factor of two as compared with conventionally processed blanks. The fractures appear to initiate primarily at imperfections on the edges of these samples.
- Research Organization:
- New Mexico Univ., Albuquerque (USA). Center for High Technology Materials; Sandia National Labs., Albuquerque, NM (USA)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 6063882
- Report Number(s):
- SAND-86-0528C; CONF-8604148-1; ON: DE86007616
- Resource Relation:
- Conference: Ideas in science and electronics conference, Albuquerque, NM, USA, 29 Apr 1986; Other Information: Portions of this document are illegible in microfiche products
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
QUARTZ
RESONATORS
FABRICATION
FRACTURE MECHANICS
MATHEMATICAL MODELS
POLISHING
STRESSES
CHALCOGENIDES
ELECTRONIC EQUIPMENT
EQUIPMENT
MECHANICS
MINERALS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
SILICON COMPOUNDS
SILICON OXIDES
SURFACE FINISHING
420200* - Engineering- Facilities
Equipment
& Techniques
360603 - Materials- Properties