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Title: Differentially pumped low-energy ion beam system for an ultrahigh-vacuum atom-probe field-ion microscope

Journal Article · · Rev. Sci. Instrum.; (United States)
DOI:https://doi.org/10.1063/1.1135998· OSTI ID:6060064

An ultrahigh-vacuum (UHV) differentially pumped low-energy (50--3000 eV) ion beam system for the in situ irradiation of specimens in a UHV atom-probe field-ion microscope (FIM) was designed and constructed. The ion beam system consisted of a Finkelstein-type ion source, an Einzel lens, and a magnetic mass analyzer. The ion source was connected to the analyzer chamber by small apertures which resulted in differential pumping between the ion source and the analyzer chamber; during a typical in situ irradiation of a specimen in the atom-probe FIM the total pressure was maintained at approx. =10/sup -7/ Torr. In the case of helium ion irradiation the optimum ion-current density was approx. =0.5 ..mu..A cm/sup -2/ for 300-eV He/sup +/ ions at the atom-probe FIM specimen. After the completion of a helium ion irradiation the pumpdown time from 5 x 10/sup -7/ to approx. =3 x 10/sup -10/ Torr in the atom-probe FIM chamber was 0.5 h.

Research Organization:
Department of Materials Science and Engineering and the Materials Science Center, Bard Hall, Cornell University, Ithaca, New York 14853
OSTI ID:
6060064
Journal Information:
Rev. Sci. Instrum.; (United States), Vol. 50:9
Country of Publication:
United States
Language:
English