Effects of boron profiles on the open circuit voltage of p-i-n and n-i-p amorphous silicon solar cells
Journal Article
·
· Appl. Phys. Lett.; (United States)
Data are presented showing that boron carryover into the i layer is responsible for the commonly observed difference in open circuit voltage between p-i-n and n-i-p amorphous silicon solar cells. It is proposed that the lower voltage samples are being limited by surface recombination at the p/i interface and that boron carryover reduces this recombination current. The V/sub oc/ is then able to rise to the point where it is limited by the bulk recombination current.
- Research Organization:
- E and I Sector Laboratory, 3M Center, St. Paul, Minnesota 55144
- OSTI ID:
- 5984425
- Journal Information:
- Appl. Phys. Lett.; (United States), Vol. 48:22
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
14 SOLAR ENERGY
SILICON SOLAR CELLS
ELECTRIC POTENTIAL
IMPURITIES
BORON
ELECTRIC CURRENTS
INTERFACES
P-N JUNCTIONS
RECOMBINATION
CURRENTS
DIRECT ENERGY CONVERTERS
ELEMENTS
EQUIPMENT
JUNCTIONS
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
SEMICONDUCTOR JUNCTIONS
SEMIMETALS
SOLAR CELLS
SOLAR EQUIPMENT
140501* - Solar Energy Conversion- Photovoltaic Conversion
SILICON SOLAR CELLS
ELECTRIC POTENTIAL
IMPURITIES
BORON
ELECTRIC CURRENTS
INTERFACES
P-N JUNCTIONS
RECOMBINATION
CURRENTS
DIRECT ENERGY CONVERTERS
ELEMENTS
EQUIPMENT
JUNCTIONS
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
SEMICONDUCTOR JUNCTIONS
SEMIMETALS
SOLAR CELLS
SOLAR EQUIPMENT
140501* - Solar Energy Conversion- Photovoltaic Conversion