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Title: Low resistance Ohmic contacts to high-T/sub c/ superconducting thin films

Conference · · IEEE Trans. Magn.; (United States)
OSTI ID:5947871

Metal contacts to high T/sub c/ superconducting thin films have been studied. By analyzing the I-V characteristics at contact junctions and by synchrotron radiation photoemission spectroscopy, the effect of contact metal and surface treatments before depositing contact metal on the metal-superconductor interface characteristics has been investigated. Low resistance ohmic contacts are realized by the following sequence of processes: (1) oxygen ion sputter etching, (2) high-pressure oxygen plasma treatment, and (3) in-situ depositing Au with no interfacial reaction to the superconductor. A low contact resistivity equal to 5.5 x 10/sup -7/ Ohm.cm/sup 1/ at 77 K is realized experimentally.

Research Organization:
9901600
OSTI ID:
5947871
Report Number(s):
CONF-880812-; TRN: 89-018597
Journal Information:
IEEE Trans. Magn.; (United States), Vol. 25:2; Conference: Applied superconductivity conference, San Francisco, CA, USA, 21-25 Aug 1988
Country of Publication:
United States
Language:
English