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Title: Possibilities for projection x-ray lithography using holographic optical elements

Conference · · Applied Optics
DOI:https://doi.org/10.1364/ao.30.001580· OSTI ID:5926650
 [1];  [2]
  1. Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
  2. State University of New York (SUNY), Stony Brook, NY (United States)
+ Show Author Affiliations

The use of a single flat grazing incidence reflector on which a computer-generated hologram has been written is proposed for projection x-ray lithography.

Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States); State University of New York (SUNY), Stony Brook, NY (United States)
Sponsoring Organization:
USDOE Office of Science (SC); National Science Foundation (NSF)
DOE Contract Number:
AC03-76SF00098; FG02-89ER60858; 431-3378A; BBS8618066
OSTI ID:
5926650
Report Number(s):
LBL-30057; CONF-9104203-1; ON: DE91009770
Journal Information:
Applied Optics, Vol. 30, Issue 13; Conference: Soft-X-Ray Projection Lithography Topical Meeting, Monterey, CA (United States), 10-12 Apr 1991; ISSN 0003-6935
Publisher:
Optical Society of America (OSA)
Country of Publication:
United States
Language:
English

References (6)

Reflective systems design study for soft x-ray projection lithography journal November 1990
Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm journal November 1990
Synchrotrom radiation X-ray lithography journal May 1984
Iterative Method Applied To Image Reconstruction And To Computer-Generated Holograms journal June 1980
THE FUTURE of manufacturing with OPTICAL MICROLITHOGRAPHY journal October 1990
High-resolution VUV spectroscopic facility at the Photon Factory journal March 1986

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Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
47 OTHER INSTRUMENTATION
HOLOGRAPHY
IMAGE PROCESSING
X-RAY SOURCES
OPTICAL SYSTEMS
SPATIAL RESOLUTION
EQUIPMENT
PROCESSING
RADIATION SOURCES
RESOLUTION
X-RAY EQUIPMENT
Projection X-Ray Techniques
Alternative Approach
656002* - Condensed Matter Physics- General Techniques in Condensed Matter- (1987-)
440600 - Optical Instrumentation- (1990-)