Plasmachemical methods for obtaining silicon and boron nitrides on indium antimonide
The authors describe plasmachemical methods for synthesizing insulating layers which enable obtaining InSb-MIS structures with parameters that are comparable with those obtained by the method of chemical deposition of SiO/sub 2/ from a mixture of monosilane and oxygen. The authors selected hexamethylcyclotrisilasane ((CH/sub 3/)/sub 2/SiNH)/sub 3/ (HMCTS) and borazine (B/sub 3/N/sub 3/H/sub 6/), which are less expensive and more easily obtained in the pure state than monosilane, as the starting reagents for the plasmachemical synthesis of the layers. The HMCTS films were deposited with a tunnel reactor employing plasma excitation of the inductive type, while the boron nitride layers were obtained in a reactor of the planar type. The authors studied the chemical composition of the films by single-transmission IR spectroscopy and by the method of repeated breakdown of total internal reflection.
- OSTI ID:
- 5894255
- Journal Information:
- Sov. Microelectron.; (United States), Vol. 15:2; Other Information: Translated from Mikroelektronika Arad. Nauk SSSR; 15: No. 2, 146-149(Mar-Apr 1986)
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
BORON NITRIDES
DIELECTRIC PROPERTIES
INFRARED SPECTRA
PLASMA ARC SPRAYING
REFRACTIVITY
SILICON NITRIDES
ANTIMONY ALLOYS
INDIUM ALLOYS
INTERMETALLIC COMPOUNDS
ORGANOMETALLIC COMPOUNDS
PYROLYSIS
SILICON OXIDES
SPECTROPHOTOMETRY
SPRAYED COATINGS
SUBSTRATES
ALLOYS
BORON COMPOUNDS
CHALCOGENIDES
CHEMICAL REACTIONS
COATINGS
DECOMPOSITION
DEPOSITION
ELECTRICAL PROPERTIES
NITRIDES
NITROGEN COMPOUNDS
OPTICAL PROPERTIES
ORGANIC COMPOUNDS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
PNICTIDES
SILICON COMPOUNDS
SPECTRA
SPRAY COATING
SURFACE COATING
THERMOCHEMICAL PROCESSES
360202* - Ceramics
Cermets
& Refractories- Structure & Phase Studies
360204 - Ceramics
Cermets
& Refractories- Physical Properties