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Title: Ion microprobe mass spectrometry using sputtering atomization and resonance ionization: Final report

Abstract

Resonance ionization mass spectrometry (RIMS) utilizing ion beam sputtering has been applied to the measurement of U. The goal is to produce an ultra-sensitive technique for analysis of small environmental particles. The method has also been compared with secondary ion mass spectrometry (SIMS). Samples studied were uranium metal, UO/sub 2/ (polycrystalline and single crystal), and U/sub 3/O/sub 8/. The overall efficiency of detection for sputter atomization/resonance ionization mass spectrometry (SA/RIMS), U/sup +/ photoions counted/U atoms sputtered, was approximately 9 x 10/sup -4/. Results indicate that the density of ground-state U atoms sputtered from such samples is quite sensitive to oxygen content and surface contamination. The relative ratio of ground-state U atoms sputtered from U metal and UO/sub 2/ (U/sup 0//sub metal//U/sup 0//sub oxide/) with Ar/sup +/ was estimated as 4.4 x 10/sup 1/. This relatively large matrix effect severely limits the applicability of SA/RIMS to quantitative analysis of uranium samples. 11 figs., 2 tabs.

Authors:
; ; ; ;
Publication Date:
Research Org.:
Oak Ridge National Lab., TN (USA)
OSTI Identifier:
5890469
Report Number(s):
ORNL/TM-10643
ON: DE88003688
DOE Contract Number:  
AC05-84OR21400
Resource Type:
Technical Report
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; URANIUM; RESONANCE IONIZATION MASS SPECTROSCOPY; ARGON IONS; COMPARATIVE EVALUATIONS; ENVIRONMENTAL MATERIALS; ION MICROPROBE ANALYSIS; IONS; PROGRESS REPORT; SPUTTERING; URANIUM OXIDES; ACTINIDE COMPOUNDS; ACTINIDES; CHALCOGENIDES; CHARGED PARTICLES; CHEMICAL ANALYSIS; DOCUMENT TYPES; ELEMENTS; MASS SPECTROSCOPY; MATERIALS; METALS; MICROANALYSIS; NONDESTRUCTIVE ANALYSIS; OXIDES; OXYGEN COMPOUNDS; SPECTROSCOPY; URANIUM COMPOUNDS; 400102* - Chemical & Spectral Procedures

Citation Formats

Goeringer, D E, Christie, W H, Bertram, L K, Walker, R L, and Carter, J A. Ion microprobe mass spectrometry using sputtering atomization and resonance ionization: Final report. United States: N. p., 1987. Web.
Goeringer, D E, Christie, W H, Bertram, L K, Walker, R L, & Carter, J A. Ion microprobe mass spectrometry using sputtering atomization and resonance ionization: Final report. United States.
Goeringer, D E, Christie, W H, Bertram, L K, Walker, R L, and Carter, J A. Tue . "Ion microprobe mass spectrometry using sputtering atomization and resonance ionization: Final report". United States.
@article{osti_5890469,
title = {Ion microprobe mass spectrometry using sputtering atomization and resonance ionization: Final report},
author = {Goeringer, D E and Christie, W H and Bertram, L K and Walker, R L and Carter, J A},
abstractNote = {Resonance ionization mass spectrometry (RIMS) utilizing ion beam sputtering has been applied to the measurement of U. The goal is to produce an ultra-sensitive technique for analysis of small environmental particles. The method has also been compared with secondary ion mass spectrometry (SIMS). Samples studied were uranium metal, UO/sub 2/ (polycrystalline and single crystal), and U/sub 3/O/sub 8/. The overall efficiency of detection for sputter atomization/resonance ionization mass spectrometry (SA/RIMS), U/sup +/ photoions counted/U atoms sputtered, was approximately 9 x 10/sup -4/. Results indicate that the density of ground-state U atoms sputtered from such samples is quite sensitive to oxygen content and surface contamination. The relative ratio of ground-state U atoms sputtered from U metal and UO/sub 2/ (U/sup 0//sub metal//U/sup 0//sub oxide/) with Ar/sup +/ was estimated as 4.4 x 10/sup 1/. This relatively large matrix effect severely limits the applicability of SA/RIMS to quantitative analysis of uranium samples. 11 figs., 2 tabs.},
doi = {},
url = {https://www.osti.gov/biblio/5890469}, journal = {},
number = ,
volume = ,
place = {United States},
year = {1987},
month = {12}
}

Technical Report:
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