Glass etching initiated by excimer laser photolysis of CF/sub 2/Br/sub 2/
KrF and ArF excimer laser irradiation of glass surfaces immersed in gaseous CF/sub 2/Br/sub 2/ is found to induce etching. The etch mechanism is considered to be nonthermal on the basis of the small value of the glass absorption coefficent and wavelength variable etching experiments. The etch rate dependence on surface fluence is presented for three pressures. SEM photos reveal a rough surface morphology in the etched region that apparently is not a chemical effect but results solely from the laser irradiation. Photochemical and spectroscopic analysis of the irradiated gas provides evidence for CF/sub 2/ and CF/sub 2/Br as being major photolysis products. C/sub 2/F/sub 4/ was also found to cause etching at 248 and 193 nm. This is evidence that CF/sub 2/, resulting from C/sub 2/F/sub 4/ photolysis, is alone capable of initiating glass etching in the presence of laser light. The paper concludes by discussing the observed inability of the CF/sub 3/ releasing parent gases CF/sub 3/Br and CF/sub 3/I to significantly etch glass when irradiated in their appropriate absorption bands. 31 references, 9 figures, 1 table.
- Research Organization:
- IBM General Technology Div., Hopewell Junction, NY
- OSTI ID:
- 5850633
- Journal Information:
- J. Phys. Chem.; (United States), Vol. 90:9
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
BOROSILICATE GLASS
ETCHING
ORGANIC BROMINE COMPOUNDS
PHOTOLYSIS
ORGANIC FLUORINE COMPOUNDS
EXCIMER LASERS
EXPERIMENTAL DATA
SCANNING ELECTRON MICROSCOPY
CHEMICAL REACTIONS
DATA
DECOMPOSITION
ELECTRON MICROSCOPY
GAS LASERS
GLASS
INFORMATION
LASERS
MICROSCOPY
NUMERICAL DATA
ORGANIC COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
PHOTOCHEMICAL REACTIONS
SURFACE FINISHING
360601* - Other Materials- Preparation & Manufacture
400500 - Photochemistry