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Title: Magnetron sputter deposition of boron and boron carbide

Abstract

The fabrication of x-ray optical coatings with greater reflectivity required the development of sputter deposition processes for boron and boron carbide. The use of high density boron and boron carbide and a vacuum brazed target design was required to achieve the required sputter process stability and resistance to the thermal stress created by high rate sputtering. The results include a description of the target fabrication procedures and sputter process parameters necessary to fabricate B{sub 4}C{sup (1)} and B{sup (2)} modulated thin film structures. 3 refs., 6 figs.

Authors:
; ; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab., CA (USA)
Sponsoring Org.:
USDOE; USDOE, Washington, DC (USA)
OSTI Identifier:
5845602
Report Number(s):
UCRL-JC-106571; CONF-9104231-1
ON: DE91011194
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Conference
Resource Relation:
Conference: International conference on metallurgical coatings and thin films (ICMCTF), Waldorf, MD (USA), 22-26 Apr 1991
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; BORON; PHYSICAL VAPOR DEPOSITION; BORON CARBIDES; AMBIENT TEMPERATURE; AMORPHOUS STATE; DESIGN; FABRICATION; FRACTURES; PERFORMANCE; SPUTTERING; SUBSTRATES; TARGETS; USES; VAPOR DEPOSITED COATINGS; BORON COMPOUNDS; CARBIDES; CARBON COMPOUNDS; COATINGS; DEPOSITION; ELEMENTS; FAILURES; SEMIMETALS; SURFACE COATING; 360201* - Ceramics, Cermets, & Refractories- Preparation & Fabrication; 360601 - Other Materials- Preparation & Manufacture

Citation Formats

McKernan, M A, Makowiecki, D, Ramsey, P, and Jankowski, A. Magnetron sputter deposition of boron and boron carbide. United States: N. p., 1991. Web.
McKernan, M A, Makowiecki, D, Ramsey, P, & Jankowski, A. Magnetron sputter deposition of boron and boron carbide. United States.
McKernan, M A, Makowiecki, D, Ramsey, P, and Jankowski, A. 1991. "Magnetron sputter deposition of boron and boron carbide". United States.
@article{osti_5845602,
title = {Magnetron sputter deposition of boron and boron carbide},
author = {McKernan, M A and Makowiecki, D and Ramsey, P and Jankowski, A},
abstractNote = {The fabrication of x-ray optical coatings with greater reflectivity required the development of sputter deposition processes for boron and boron carbide. The use of high density boron and boron carbide and a vacuum brazed target design was required to achieve the required sputter process stability and resistance to the thermal stress created by high rate sputtering. The results include a description of the target fabrication procedures and sputter process parameters necessary to fabricate B{sub 4}C{sup (1)} and B{sup (2)} modulated thin film structures. 3 refs., 6 figs.},
doi = {},
url = {https://www.osti.gov/biblio/5845602}, journal = {},
number = ,
volume = ,
place = {United States},
year = {1991},
month = {3}
}

Conference:
Other availability
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