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Title: Photoresponsive semiconductor device having a double layer anti-reflective coating

Patent ·
OSTI ID:5838279

Disclosed is an improved dual layer anti-reflective coating for use in a photoresponsive semiconductor device, and a device incorporating the coating. The coating has a uniformly low parasitic absorbance in the range of about 475 to 600 nanometers. The dual layer has an incident light layer and an intermediate layer. The intermediate layer is formed of a silicon alloy material having at least one band gap widening element incorporated therein. The index of refraction of the intermediate layer has an index of refraction intermediate the indexes of the incident light layer and the underlying photoresponsive semiconductor device.

Assignee:
Energy Conversion Devices, Inc.
Patent Number(s):
US 4528418
OSTI ID:
5838279
Resource Relation:
Patent File Date: Filed date 24 Feb 1984; Other Information: PAT-APPL-582984
Country of Publication:
United States
Language:
English