Ion implantation. 1973-November 1980 (citations from the International Aerospace Abstracts Data Base). Report for 1973-November 1980
Technical Report
·
OSTI ID:5770556
This bibliography of citations to the international literature concerns ion implantation methods for introducing impurities into the surface layer of a solid, particularly as applied to semiconductor devices such as field-effect transistors and solar cells. Specific topics include equipment, techniques, semiconductor doping, and radiation effects on material properties. (This updated bibliography contains 309 citations, 76 of which are new entries to the previous edition.)
- Research Organization:
- New Mexico Univ., Albuquerque (USA). Technology Application Center
- OSTI ID:
- 5770556
- Report Number(s):
- PB-81-802316
- Country of Publication:
- United States
- Language:
- English
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