Thin film properties of sputtered niobium silicide on SiO/sub 2/, Si/sub 3/N/sub 4/, and N/sup +/ poly-Si

Journal Article · Wed Jan 01 00:00:00 EST 1986 · J. Electrochem. Soc.; (United States)

OSTI ID:5743201

Chow, T P; Lu, W J; Steckl, A J; Baliga, B J

Thin film properties of niobium silicide sputtered from a slightly silicon-rich (Si/Nb approx. = 2.3), cold-pressed alloy target onto SiO/sub 2/, Si/sub 3/N/sub 4/, and n doped poly-Si have been investigated. The structural and compositional properties were examined with x-ray diffraction, Rutherford backscattering spectrometry (RBS), and secondary ion mass spectrometry (SIMS). X-ray diffraction revealed that NbSi/sub 2/ was the predominant silicide phase present, unlike those films reported previously, which contained significant amounts of an intermediate silicide phase (Nb/sub 5/Si/sub 3/). These films had a SiNb ratio of 2.1 as determined from RBS and contained lower levels of common contaminants (such as N/sub 2/, O/sub 2/, and carbon). Isochronal and isothermal annealing showed that the major decrease in resistivity occurred in the first 5 min, and a resistivity value of approx. =70 ..mu cap omega..-cm was obtained after annealing at 1000/sup 0/C. During annealing, phosphorus was found to diffuse through NbSi/sub 2/ rapidly, similar to other refractory silicides.

• Research Organization: General Electric Co., Corporate Research and Development, Schenectady, NY 12301
• OSTI ID: 5743201
• Journal Information: J. Electrochem. Soc.; (United States), Vol. 133:1
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
NIOBIUM SILICIDES
SPUTTERING
X-RAY DIFFRACTION
ANNEALING
COLD PRESSING
DIFFUSION
ELECTRIC CONDUCTIVITY
ION MICROPROBE ANALYSIS
ISOTHERMAL PROCESSES
MASS SPECTROSCOPY
PHOSPHORUS
RUTHERFORD SCATTERING
SILICON NITRIDES
SILICON OXIDES
THIN FILMS
VERY HIGH TEMPERATURE
CHALCOGENIDES
CHEMICAL ANALYSIS
COHERENT SCATTERING
DIFFRACTION
ELASTIC SCATTERING
ELECTRICAL PROPERTIES
ELEMENTS
FABRICATION
FILMS
HEAT TREATMENTS
MATERIALS WORKING
MICROANALYSIS
NIOBIUM COMPOUNDS
NITRIDES
NITROGEN COMPOUNDS
NONDESTRUCTIVE ANALYSIS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
PNICTIDES
PRESSING
REFRACTORY METAL COMPOUNDS
SCATTERING
SILICIDES
SILICON COMPOUNDS
SPECTROSCOPY
TRANSITION ELEMENT COMPOUNDS
360602* - Other Materials- Structure & Phase Studies