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Title: Power absorption corresponding to ion losses in parallel-plate RF discharges

Abstract

In this paper a simple model of a symmetric parallel-plate RF discharge is studied to illustrate how such discharges may absorb power from an RF power supply in order to sustain dc power losses corresponding to the steady acceleration of ions through the sheaths. The motions of the sheath boundaries over one period are derived assuming that the current density varies as J{sub 0} sin {omega}t. One finds that the sheath thickness increases discontinuously at one sheath whenever the plasma contacts the opposing electrode. This implies that the external power supply delivers an electron pulse from the electrode at high potential to the electrode at lower potential, so that some power is being absorbed in a pulsed fashion. The power absorbed by the discharge is also calculated for the portions of the RF cycle where the current varies sinusoidally. It is found that power is supplied by the discharge in this phase of the RF cycle, with the energy coming from the deflating sheaths. It is further shown that the sum of the pulsed power absorption and smooth power generation, averaged over one RF period, is equal to the dc ion power losses arising from ions falling through the time-averagedmore » sheath potentials.« less

Authors:
 [1]
  1. California Univ., Berkeley, CA (United States). Dept. of Electrical Engineering and Computer Sciences
Publication Date:
Sponsoring Org.:
National Science Foundation (NSF); National Science Foundation, Washington, DC (United States)
OSTI Identifier:
5709161
Resource Type:
Journal Article
Journal Name:
IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States)
Additional Journal Information:
Journal Volume: 19:2; Journal ID: ISSN 0093-3813
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; 99 GENERAL AND MISCELLANEOUS//MATHEMATICS, COMPUTING, AND INFORMATION SCIENCE; HIGH-FREQUENCY DISCHARGES; ENERGY ABSORPTION; PLASMA SHEATH; ION DRIFT; ACCELERATION; ENERGY LOSSES; IONS; MATHEMATICAL MODELS; PARTICLE LOSSES; PLATES; POWER SUPPLIES; PULSES; STEADY-STATE CONDITIONS; THICKNESS; ABSORPTION; CHARGED PARTICLES; DIMENSIONS; ELECTRIC DISCHARGES; ELECTRONIC EQUIPMENT; EQUIPMENT; LOSSES; 426000* - Engineering- Components, Electron Devices & Circuits- (1990-); 990200 - Mathematics & Computers

Citation Formats

Sato, A H. Power absorption corresponding to ion losses in parallel-plate RF discharges. United States: N. p., 1991. Web. doi:10.1109/27.106816.
Sato, A H. Power absorption corresponding to ion losses in parallel-plate RF discharges. United States. doi:10.1109/27.106816.
Sato, A H. Mon . "Power absorption corresponding to ion losses in parallel-plate RF discharges". United States. doi:10.1109/27.106816.
@article{osti_5709161,
title = {Power absorption corresponding to ion losses in parallel-plate RF discharges},
author = {Sato, A H},
abstractNote = {In this paper a simple model of a symmetric parallel-plate RF discharge is studied to illustrate how such discharges may absorb power from an RF power supply in order to sustain dc power losses corresponding to the steady acceleration of ions through the sheaths. The motions of the sheath boundaries over one period are derived assuming that the current density varies as J{sub 0} sin {omega}t. One finds that the sheath thickness increases discontinuously at one sheath whenever the plasma contacts the opposing electrode. This implies that the external power supply delivers an electron pulse from the electrode at high potential to the electrode at lower potential, so that some power is being absorbed in a pulsed fashion. The power absorbed by the discharge is also calculated for the portions of the RF cycle where the current varies sinusoidally. It is found that power is supplied by the discharge in this phase of the RF cycle, with the energy coming from the deflating sheaths. It is further shown that the sum of the pulsed power absorption and smooth power generation, averaged over one RF period, is equal to the dc ion power losses arising from ions falling through the time-averaged sheath potentials.},
doi = {10.1109/27.106816},
journal = {IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States)},
issn = {0093-3813},
number = ,
volume = 19:2,
place = {United States},
year = {1991},
month = {4}
}