Surface properties of poly(ethylene terephthalate) films modified by far-ultraviolet radiation at 193 nm (laser) and 185 nm (low intensity)
The surfaces of poly(ethylene terephthalate) obtained by irradiation with the 193-nm pulsed radiation of the ArF excimer laser (10/sup 7/ W/cm/sup 2/) in air or the 185-nm low-intensity (2.5 mW/cm/sup 2/) radiation of the mercury lamp in a vacuum were studied and compared. The XPS analysis reveals that both are depleted in oxygen, but the efficiency of the change is intensity dependent as a result of nonlinear effects at high intensity. The pulsed radiation, which gives ablative photodecomposition when the energy of the pulse is > 40 mJ/cm/sup 2/, yields a rough surface. SEM analysis shows that the roughness (i) has an amplitude which increases with the accumulation of pulses and reaches a maximum (1-2-..mu..m spacing) at 10 pulses, and (ii) shows some periodicity. Since the chemical composition of the laser-treated surface does not vary with the accumulation of pulses, the increase in the advancing contact angle with water is interpreted as due to roughness. Labeling reactions and XPS have been used to probe the reactivity of the modified surfaces. Carboxylic acids, alcohols, and olefins were qualitatively and quantitatively probed. 33 references, 10 figures, 2 tables.
- Research Organization:
- IBM Thomas J. Watson Research Center, Yorktown Heights, NY
- OSTI ID:
- 5698330
- Journal Information:
- J. Phys. Chem.; (United States), Vol. 90:10
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
FILMS
SURFACE PROPERTIES
POLYMERS
SURFACES
PHOTOCHEMICAL REACTIONS
TEREPHTHALIC ACID
EXCIMER LASERS
EXPERIMENTAL DATA
FAR ULTRAVIOLET RADIATION
PHOTOELECTRON SPECTROSCOPY
SCANNING ELECTRON MICROSCOPY
CARBOXYLIC ACIDS
CHEMICAL REACTIONS
DATA
DICARBOXYLIC ACIDS
ELECTROMAGNETIC RADIATION
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
GAS LASERS
INFORMATION
LASERS
MICROSCOPY
NUMERICAL DATA
ORGANIC ACIDS
ORGANIC COMPOUNDS
RADIATIONS
SPECTROSCOPY
ULTRAVIOLET RADIATION
400500* - Photochemistry