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Title: [101] Oriented Pr{sub 0.7}Ca{sub 0.3-x}Sr{sub x}MnO{sub 3-{delta}} thin films prepared by rf magnetron reactive sputtering

Abstract

The synthesis of thin films of manganite materials was achieved using rf magnetron reactive sputtering. The nanostructure of these materials plays a key role in the giant magnetoresistance (GMR) properties of the material. 22 refs., 11 figs., 1 tab.

Authors:
; ;  [1]
  1. Universite de Caen (France); and others
Publication Date:
OSTI Identifier:
569168
Resource Type:
Journal Article
Journal Name:
Chemistry of Materials
Additional Journal Information:
Journal Volume: 9; Journal Issue: 5; Other Information: PBD: May 1997
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 40 CHEMISTRY; SPUTTERING; THIN FILMS; COMPOSITE MATERIALS; CHEMICAL COMPOSITION; ORIENTATION; X-RAY DIFFRACTION; ELECTRON DIFFRACTION; STRUCTURAL CHEMICAL ANALYSIS; MAGNETIC PROPERTIES; CURIE POINT; MAGNETORESISTANCE; ELECTRIC CONDUCTIVITY; CRYSTAL STRUCTURE; PEROVSKITES; STRUCTURE-ACTIVITY RELATIONSHIPS; OPTIMIZATION; SYNTHESIS; ELECTRICAL PROPERTIES

Citation Formats

Mercey, B, Lecoeur, P, and Wolfman, J. [101] Oriented Pr{sub 0.7}Ca{sub 0.3-x}Sr{sub x}MnO{sub 3-{delta}} thin films prepared by rf magnetron reactive sputtering. United States: N. p., 1997. Web. doi:10.1021/cm960572b.
Mercey, B, Lecoeur, P, & Wolfman, J. [101] Oriented Pr{sub 0.7}Ca{sub 0.3-x}Sr{sub x}MnO{sub 3-{delta}} thin films prepared by rf magnetron reactive sputtering. United States. https://doi.org/10.1021/cm960572b
Mercey, B, Lecoeur, P, and Wolfman, J. 1997. "[101] Oriented Pr{sub 0.7}Ca{sub 0.3-x}Sr{sub x}MnO{sub 3-{delta}} thin films prepared by rf magnetron reactive sputtering". United States. https://doi.org/10.1021/cm960572b.
@article{osti_569168,
title = {[101] Oriented Pr{sub 0.7}Ca{sub 0.3-x}Sr{sub x}MnO{sub 3-{delta}} thin films prepared by rf magnetron reactive sputtering},
author = {Mercey, B and Lecoeur, P and Wolfman, J},
abstractNote = {The synthesis of thin films of manganite materials was achieved using rf magnetron reactive sputtering. The nanostructure of these materials plays a key role in the giant magnetoresistance (GMR) properties of the material. 22 refs., 11 figs., 1 tab.},
doi = {10.1021/cm960572b},
url = {https://www.osti.gov/biblio/569168}, journal = {Chemistry of Materials},
number = 5,
volume = 9,
place = {United States},
year = {Thu May 01 00:00:00 EDT 1997},
month = {Thu May 01 00:00:00 EDT 1997}
}