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Title: Room temperature oxidation of Ni(110) exposed to high oxygen pressures

Abstract

The techniques of high resolution electron energy loss spectroscopy (HREELS), x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and low energy electron diffraction (LEED) have been used to investigate the thickening of the oxide and hydroxide layers on Ni(110) single crystals at room temperature. Sputter cleaned and annealed samples were exposed to oxygen at pressures between 0.1 to 100 Torr and times of 30 min. to 15 hrs. The XPS data indicate that low pressure oxygen exposures result in the formation of a high binding energy O ls species which is confined to the near surface region of the overlayer film. In comparison with a Ni(OH){sub 2} standard, the high binding energy oxygen species is assigned to the oxygen state for Ni(OH){sub 2}. The oxidation of nickel is divided into three reaction regimes, namely chemisorption, island nucleation and growth to coalescence, and thickening of the coalesced oxide. It has been proposed that the presence of an adsorbed charged oxygen species observed at high oxygen pressures may induce thickening of the oxide according to the Mott theory of field assisted ionic transport. At high pressure oxygen exposures, thickening of the NiO layer does not occur. Any observed increase in the overlayermore » thickness is confined to growth of the Ni(OH){sub 2} layer located at the near surface region. The ratio of O{sub 2}/H{sub 2}O in the oxidizing environment does not affect the composition of the final overlayer film but only the exposure at which this film is formed. The HREELS data indicate that the hydroxide species are not in an adsorbed chemical state but are due to the formation of Ni(OH){sub 2} in agreement with the XPS data.« less

Authors:
 [1]
  1. Florida Univ., Gainesville, FL (USA)
Publication Date:
Research Org.:
Florida Univ., Gainesville, FL (USA)
Sponsoring Org.:
DOE/ER
OSTI Identifier:
5658795
Report Number(s):
DOE/ER/45155-T2
ON: DE89017816; TRN: 89-024722
DOE Contract Number:  
FG05-84ER45155
Resource Type:
Technical Report
Resource Relation:
Other Information: Thesis (M.S.)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; NICKEL; OXIDATION; AUGER ELECTRON SPECTROSCOPY; BINDING ENERGY; CHEMICAL REACTION KINETICS; CHEMISORPTION; ELECTRON DIFFRACTION; ENERGY-LOSS SPECTROSCOPY; NICKEL HYDROXIDES; NICKEL OXIDES; NUCLEATION; OXYGEN; PHOTOELECTRON SPECTROSCOPY; THIN FILMS; CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; DIFFRACTION; ELECTRON SPECTROSCOPY; ELEMENTS; ENERGY; FILMS; HYDROGEN COMPOUNDS; HYDROXIDES; KINETICS; METALS; NICKEL COMPOUNDS; NONMETALS; OXIDES; OXYGEN COMPOUNDS; REACTION KINETICS; SCATTERING; SEPARATION PROCESSES; SORPTION; SPECTROSCOPY; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS; 360105* - Metals & Alloys- Corrosion & Erosion

Citation Formats

Dykstal, C N. Room temperature oxidation of Ni(110) exposed to high oxygen pressures. United States: N. p., 1988. Web.
Dykstal, C N. Room temperature oxidation of Ni(110) exposed to high oxygen pressures. United States.
Dykstal, C N. Fri . "Room temperature oxidation of Ni(110) exposed to high oxygen pressures". United States.
@article{osti_5658795,
title = {Room temperature oxidation of Ni(110) exposed to high oxygen pressures},
author = {Dykstal, C N},
abstractNote = {The techniques of high resolution electron energy loss spectroscopy (HREELS), x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and low energy electron diffraction (LEED) have been used to investigate the thickening of the oxide and hydroxide layers on Ni(110) single crystals at room temperature. Sputter cleaned and annealed samples were exposed to oxygen at pressures between 0.1 to 100 Torr and times of 30 min. to 15 hrs. The XPS data indicate that low pressure oxygen exposures result in the formation of a high binding energy O ls species which is confined to the near surface region of the overlayer film. In comparison with a Ni(OH){sub 2} standard, the high binding energy oxygen species is assigned to the oxygen state for Ni(OH){sub 2}. The oxidation of nickel is divided into three reaction regimes, namely chemisorption, island nucleation and growth to coalescence, and thickening of the coalesced oxide. It has been proposed that the presence of an adsorbed charged oxygen species observed at high oxygen pressures may induce thickening of the oxide according to the Mott theory of field assisted ionic transport. At high pressure oxygen exposures, thickening of the NiO layer does not occur. Any observed increase in the overlayer thickness is confined to growth of the Ni(OH){sub 2} layer located at the near surface region. The ratio of O{sub 2}/H{sub 2}O in the oxidizing environment does not affect the composition of the final overlayer film but only the exposure at which this film is formed. The HREELS data indicate that the hydroxide species are not in an adsorbed chemical state but are due to the formation of Ni(OH){sub 2} in agreement with the XPS data.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1988},
month = {1}
}

Technical Report:
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