Structure and surface morphology of highly conductive RuO{sub 2} films grown on MgO by oxygen-plasma-assisted molecular beam epitaxy
- Pacific Northwest National Laboratory, P.O. Box 999, MS K2-12, Richland, Washington 99352 (United States)
- Argonne National Laboratory, 9700 S. Cass Avenue, Argonne, Illinois 60439 (United States)
Metallic RuO{sub 2}(110) thin films were grown by oxygen-plasma-assisted molecular beam epitaxy (MBE) on MgO(100) and (110) at 425{degree}C. RuO{sub 2} films on MgO(100) are epitaxial with two variants, while RuO{sub 2} films on MgO(110) are highly oriented with the (110) face parallel to the substrate surface. The two variants in the RuO{sub 2}(110) epitaxial films resulted in a two-fold mosaic microstructure. The RuO{sub 2}(110) epitaxial films are very smooth and exhibit a low resistivity of {approximately}36 {mu}{Omega}-cm. In contrast, the RuO{sub 2}(110) textured films are very rough, and consist of small grains with a poor-in-plane alignment. A slight higher resistivity (49 {mu}{Omega}-cm) was found for the RuO{sub 2}(110) textured films grown on MgO(110). {copyright} {ital 1997 Materials Research Society.}
- Research Organization:
- Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
- DOE Contract Number:
- AC06-76RL01830
- OSTI ID:
- 565377
- Journal Information:
- Journal of Materials Research, Vol. 12, Issue 7; Other Information: PBD: Jul 1997
- Country of Publication:
- United States
- Language:
- English
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