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Title: Preparation and structural characterization of sputtered CoO, NiO, and Ni sub 0. 5 Co sub 0. 5 O thin epitaxial films

Abstract

Single phase CoO, NiO, and Ni{sub 0.5}Co{sub 0.5}O epitaxial films have been prepared by reactive sputtering onto {l angle}0001{r angle} {alpha}--Al{sub 2}O{sub 3} substrates maintained at 373 K. Epitaxy was confirmed by x-ray diffraction (XRD) and high resolution electron microscopy (HREM) techniques. XRD experiments indicate that these monoxide films are cubic and contain rotation twins with the twin axis parallel to {l angle}111{r angle}. Lattice parameters for the CoO and NiO films are 0.4254{plus minus}0.0001 nm and 0.4173{plus minus}0.0006 nm, respectively, and agree with published values for the corresponding bulk oxides. The lattice parameter 0.4220{plus minus}0.0001 nm for the Ni{sub 0.5}Co{sub 0.5}O film lies between those of CoO and NiO and suggests that the mixed oxide film is compositionally homogeneous. Cross-sectional HREM images of the Ni{sub 0.5}Co{sub 0.5}O specimen show {Sigma}3(1{bar 1}2) twin boundaries perpendicular to the oxide-substrate interface. The twin regions are approximately 30 nm in size and are uniformly distributed throughout the film. The epitaxial orientation of the monoxide films with respect to the substrate can be summarized by the relationships (111) monoxide //(0001) {alpha}--Al{sub 2}O{sub 3}, (1{bar 1}0) monoxide //(1{bar 1}00) {alpha}--Al{sub 2}O{sub 3}, and (11{bar 2}) monoxide //(11{bar 2}0) {alpha}--Al{sub 2}O{sub 3}.

Authors:
; ;  [1]; ;  [2]
  1. Department of Physics and Center for Magnetic Recording Research 0401, University of California, San Diego, La Jolla, California 92093-0401 (United States)
  2. Department of Materials Science and Mineral Engineering, University of California, Berkeley, California 94720 (United States)
Publication Date:
OSTI Identifier:
5653407
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Journal Article
Journal Name:
Journal of Materials Research; (United States)
Additional Journal Information:
Journal Volume: 6:12; Journal ID: ISSN 0884-2914
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; COBALT OXIDES; SPUTTERING; NICKEL OXIDES; THIN FILMS; EPITAXY; ELECTRON MICROSCOPY; LATTICE PARAMETERS; TEMPERATURE RANGE 0273-0400 K; TWINNING; X-RAY DIFFRACTION; CHALCOGENIDES; COBALT COMPOUNDS; COHERENT SCATTERING; DIFFRACTION; FILMS; MICROSCOPY; NICKEL COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; SCATTERING; TEMPERATURE RANGE; TRANSITION ELEMENT COMPOUNDS; 360201* - Ceramics, Cermets, & Refractories- Preparation & Fabrication; 360202 - Ceramics, Cermets, & Refractories- Structure & Phase Studies

Citation Formats

Carey, M J, Spada, F E, Berkowitz, A E, Cao, W, and Thomas, G. Preparation and structural characterization of sputtered CoO, NiO, and Ni sub 0. 5 Co sub 0. 5 O thin epitaxial films. United States: N. p., 1991. Web. doi:10.1557/JMR.1991.2680.
Carey, M J, Spada, F E, Berkowitz, A E, Cao, W, & Thomas, G. Preparation and structural characterization of sputtered CoO, NiO, and Ni sub 0. 5 Co sub 0. 5 O thin epitaxial films. United States. https://doi.org/10.1557/JMR.1991.2680
Carey, M J, Spada, F E, Berkowitz, A E, Cao, W, and Thomas, G. 1991. "Preparation and structural characterization of sputtered CoO, NiO, and Ni sub 0. 5 Co sub 0. 5 O thin epitaxial films". United States. https://doi.org/10.1557/JMR.1991.2680.
@article{osti_5653407,
title = {Preparation and structural characterization of sputtered CoO, NiO, and Ni sub 0. 5 Co sub 0. 5 O thin epitaxial films},
author = {Carey, M J and Spada, F E and Berkowitz, A E and Cao, W and Thomas, G},
abstractNote = {Single phase CoO, NiO, and Ni{sub 0.5}Co{sub 0.5}O epitaxial films have been prepared by reactive sputtering onto {l angle}0001{r angle} {alpha}--Al{sub 2}O{sub 3} substrates maintained at 373 K. Epitaxy was confirmed by x-ray diffraction (XRD) and high resolution electron microscopy (HREM) techniques. XRD experiments indicate that these monoxide films are cubic and contain rotation twins with the twin axis parallel to {l angle}111{r angle}. Lattice parameters for the CoO and NiO films are 0.4254{plus minus}0.0001 nm and 0.4173{plus minus}0.0006 nm, respectively, and agree with published values for the corresponding bulk oxides. The lattice parameter 0.4220{plus minus}0.0001 nm for the Ni{sub 0.5}Co{sub 0.5}O film lies between those of CoO and NiO and suggests that the mixed oxide film is compositionally homogeneous. Cross-sectional HREM images of the Ni{sub 0.5}Co{sub 0.5}O specimen show {Sigma}3(1{bar 1}2) twin boundaries perpendicular to the oxide-substrate interface. The twin regions are approximately 30 nm in size and are uniformly distributed throughout the film. The epitaxial orientation of the monoxide films with respect to the substrate can be summarized by the relationships (111) monoxide //(0001) {alpha}--Al{sub 2}O{sub 3}, (1{bar 1}0) monoxide //(1{bar 1}00) {alpha}--Al{sub 2}O{sub 3}, and (11{bar 2}) monoxide //(11{bar 2}0) {alpha}--Al{sub 2}O{sub 3}.},
doi = {10.1557/JMR.1991.2680},
url = {https://www.osti.gov/biblio/5653407}, journal = {Journal of Materials Research; (United States)},
issn = {0884-2914},
number = ,
volume = 6:12,
place = {United States},
year = {Sun Dec 01 00:00:00 EST 1991},
month = {Sun Dec 01 00:00:00 EST 1991}
}