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Title: Enhancement of short-circuit current by use of wide bandgap n-layers in p-i-n amorphous silicon photovoltaic cells

Patent ·
OSTI ID:5647514

This patent describes a photovoltaic cell. It comprises: a transparent substrate; a transparent front conductive layer formed on the substrate; a p-type layer formed on the front conductive layer; an i-layer of amorphous silicon formed on the p-layer; an n-type sandwich structure of amorphous silicon formed on the i-layer, the n-type sandwich structure including firs, second, and third n-layers successively formed on one another, the first n-layer being formed on the i-layer to form a rectifying junction therewith, the second n-layer being formed on the second n-layer, and the third n-layer being formed on the second n-layer, and the second n-layer having an optical bandgap wider than respective optical bandgaps of the first and third n-type layers and the i-layer; the second n-layer having a thickness at least two times the thickness of each of the first the third n-layers; and a back contact layer of conductive material formed on the third n-layer to form an ohmic contact therewith.

Assignee:
Solarex Corp., Rockville, MD (United States)
Patent Number(s):
US 5055141; A
Application Number:
PPN: US 7-467367
OSTI ID:
5647514
Resource Relation:
Patent File Date: 19 Jan 1990
Country of Publication:
United States
Language:
English