skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Nanometer-scale structure for the study of flux-line lattice shearing in superconducting double layers of a-Nb/sub 3/Ge and NbN

Journal Article · · J. Vac. Sci. Technol., B; (United States)
DOI:https://doi.org/10.1116/1.583982· OSTI ID:5613077

The fabrication of a nanometer-scale device structure for the study of flux-line lattice shearing in a superconducting double layer of 500-nm amorphous Nb/sub 3/Ge (bottom) and 50-nm polycrystalline NbN (top) is reported. The device, serving as a model system for technical type-II superconductors, consists of an array of channels in the NbN top layer, each about 100 nm wide and 500 ..mu..m long. The preliminary measurements show unique features of flux line shear in a well-defined channel structure.

Research Organization:
Centre for Submicron Technology, Delft University of Technology, Delft, The Netherlands
OSTI ID:
5613077
Journal Information:
J. Vac. Sci. Technol., B; (United States), Vol. 6:1
Country of Publication:
United States
Language:
English