Structural and hardness studies of CN{sub x}/TiN composite coatings on Si(100) substrates by laser ablation method

Journal Article · Wed Oct 01 00:00:00 EDT 1997 · Journal of Materials Engineering and Performance

DOI:https://doi.org/10.1007/s11665-997-0047-7· OSTI ID:554080

Kumar, A; Chan, H L ^[1]; Dahotre, N B ^[2]

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1. Univ. of South Alabama, Mobile, AL (United States)
2. Univ. of Tennessee Space Inst., Tullahoma, TN (United States)

CN{sub x}/TiN composite coatings were deposited on Si (100) substrates using the pulsed laser deposition (PLD) method. Previous results showed that a seed of titanium nitride (TiN) layer between silicon substrates and a top layer of carbon nitride increased the hardness and modulus values of overall composite coatings. This paper describes the same approach to growing carbon nitride composite coatings with varying thicknesses of different kinds of buffer layers and carbon nitride films on Si (100) substrates at different temperatures and pressures. Preliminary results showed the presence of carbon nitride films by the Fourier transform infrared spectroscopy (FTIR) method. The mechanical properties of the films were characterized using the nanoindentation technique. The crystallographic properties of the films were characterized using the x-ray diffractometer method.

• Sponsoring Organization: USDOE
• OSTI ID: 554080
• Journal Information: Journal of Materials Engineering and Performance, Vol. 6, Issue 5; Other Information: PBD: Oct 1997
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CRYSTAL STRUCTURE
MECHANICAL PROPERTIES
PHYSICAL VAPOR DEPOSITION
CARBON NITRIDES
TITANIUM NITRIDES
COMPOSITE MATERIALS
LASERS
THIN FILMS
SUBSTRATES
SILICON
HARDNESS
YOUNG MODULUS
X-RAY DIFFRACTION