Luminescence of molecular xenon in Xe/Ar/NF/sub 3/ and Xe/He/NF/sub 3/ mixtures excited by an electron beam

Journal Article · Wed Jan 01 00:00:00 EST 1986 · J. Appl. Spectrosc. (Engl. Transl.); (United States)

OSTI ID:5495794

Dymshits, Y I; Korobitsyn, V A

In order to obtain the conditions required to achieve simultaneous luminescence in the working mixtures of excimer lasers, the authors investigate the influence of the composition of Se/Ar/NF/sub 3/ and Xe/He/NF/sub 3/ mixtures on the intensity and kinetics of VUV radiation of molecular Xe*/sub 2/ upon excitation by an electron beam (EB). The magnitude of the EB energy that is consumed in excitation in the mixture of argon and helium particles is greater than or comparable to the magnitude of the ionization loss in xenon.

• OSTI ID: 5495794
• Journal Information: J. Appl. Spectrosc. (Engl. Transl.); (United States), Vol. 43:1
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
ARGON
LUMINESCENCE
EXCIMER LASERS
LASER MATERIALS
HELIUM
NITROGEN FLUORIDES
XENON
CHEMICAL COMPOSITION
DECAY
ELECTRON BEAM PUMPING
EXCITATION
FAR ULTRAVIOLET RADIATION
LASER RADIATION
MATERIALS TESTING
MIXTURES
DISPERSIONS
ELECTRICAL PUMPING
ELECTROMAGNETIC RADIATION
ELEMENTS
ENERGY-LEVEL TRANSITIONS
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
GAS LASERS
GASES
HALIDES
HALOGEN COMPOUNDS
LASERS
MATERIALS
NITROGEN COMPOUNDS
NONMETALS
PUMPING
RADIATIONS
RARE GASES
TESTING
ULTRAVIOLET RADIATION
420300* - Engineering- Lasers- (-1989)