Microstructure of bulk and electro-formed Ni implanted with Ti and C
Abstract
The microstructure of high-purity Ni implanted with overlapping concentration profiles of Ti and C was examined with transmission electron microscopy. An amorphous phase forms at concentrations of 15--18 at.% Ti and 22 at.% C, while a two-phase alloy (amorphous + fcc Ni) forms for {le} 16 at.% C. Electroformed layers with sub-micron fcc grains of Ni or Ni{sub 80}Fe{sub 20} were also found to be amorphized by Ti + C implantation, a key requirement for applying this treatment to Ni-based micro-electromechanical systems to reduce their friction and wear.
- Authors:
- Publication Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE Office of Energy Research, Washington, DC (United States)
- OSTI Identifier:
- 548627
- Report Number(s):
- SAND-97-1216C; CONF-9709107-
ON: DE98001189; BR: KC0201030; TRN: AHC29724%%28
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Conference
- Resource Relation:
- Conference: 10. international conference on surface modification of metals by ion beams (SMMIB-10) and commercial exhibition, Gatlinburg, TN (United States), 21-26 Sep 1997; Other Information: PBD: 13 Oct 1997
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; NICKEL; MICROSTRUCTURE; ION IMPLANTATION; TITANIUM; CARBON; ELECTRODEPOSITION; PHASE STUDIES; FRICTION FACTOR; WEAR RESISTANCE; MINIATURIZATION; MACHINERY
Citation Formats
Follstaedt, D M, Myers, S M, Knapp, J A, Dugger, M T, and Christenson, T A. Microstructure of bulk and electro-formed Ni implanted with Ti and C. United States: N. p., 1997.
Web.
Follstaedt, D M, Myers, S M, Knapp, J A, Dugger, M T, & Christenson, T A. Microstructure of bulk and electro-formed Ni implanted with Ti and C. United States.
Follstaedt, D M, Myers, S M, Knapp, J A, Dugger, M T, and Christenson, T A. 1997.
"Microstructure of bulk and electro-formed Ni implanted with Ti and C". United States. https://www.osti.gov/servlets/purl/548627.
@article{osti_548627,
title = {Microstructure of bulk and electro-formed Ni implanted with Ti and C},
author = {Follstaedt, D M and Myers, S M and Knapp, J A and Dugger, M T and Christenson, T A},
abstractNote = {The microstructure of high-purity Ni implanted with overlapping concentration profiles of Ti and C was examined with transmission electron microscopy. An amorphous phase forms at concentrations of 15--18 at.% Ti and 22 at.% C, while a two-phase alloy (amorphous + fcc Ni) forms for {le} 16 at.% C. Electroformed layers with sub-micron fcc grains of Ni or Ni{sub 80}Fe{sub 20} were also found to be amorphized by Ti + C implantation, a key requirement for applying this treatment to Ni-based micro-electromechanical systems to reduce their friction and wear.},
doi = {},
url = {https://www.osti.gov/biblio/548627},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Oct 13 00:00:00 EDT 1997},
month = {Mon Oct 13 00:00:00 EDT 1997}
}
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