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Title: Microstructure of bulk and electro-formed Ni implanted with Ti and C

Abstract

The microstructure of high-purity Ni implanted with overlapping concentration profiles of Ti and C was examined with transmission electron microscopy. An amorphous phase forms at concentrations of 15--18 at.% Ti and 22 at.% C, while a two-phase alloy (amorphous + fcc Ni) forms for {le} 16 at.% C. Electroformed layers with sub-micron fcc grains of Ni or Ni{sub 80}Fe{sub 20} were also found to be amorphized by Ti + C implantation, a key requirement for applying this treatment to Ni-based micro-electromechanical systems to reduce their friction and wear.

Authors:
; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE Office of Energy Research, Washington, DC (United States)
OSTI Identifier:
548627
Report Number(s):
SAND-97-1216C; CONF-9709107-
ON: DE98001189; BR: KC0201030; TRN: AHC29724%%28
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: 10. international conference on surface modification of metals by ion beams (SMMIB-10) and commercial exhibition, Gatlinburg, TN (United States), 21-26 Sep 1997; Other Information: PBD: 13 Oct 1997
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; NICKEL; MICROSTRUCTURE; ION IMPLANTATION; TITANIUM; CARBON; ELECTRODEPOSITION; PHASE STUDIES; FRICTION FACTOR; WEAR RESISTANCE; MINIATURIZATION; MACHINERY

Citation Formats

Follstaedt, D M, Myers, S M, Knapp, J A, Dugger, M T, and Christenson, T A. Microstructure of bulk and electro-formed Ni implanted with Ti and C. United States: N. p., 1997. Web.
Follstaedt, D M, Myers, S M, Knapp, J A, Dugger, M T, & Christenson, T A. Microstructure of bulk and electro-formed Ni implanted with Ti and C. United States.
Follstaedt, D M, Myers, S M, Knapp, J A, Dugger, M T, and Christenson, T A. 1997. "Microstructure of bulk and electro-formed Ni implanted with Ti and C". United States. https://www.osti.gov/servlets/purl/548627.
@article{osti_548627,
title = {Microstructure of bulk and electro-formed Ni implanted with Ti and C},
author = {Follstaedt, D M and Myers, S M and Knapp, J A and Dugger, M T and Christenson, T A},
abstractNote = {The microstructure of high-purity Ni implanted with overlapping concentration profiles of Ti and C was examined with transmission electron microscopy. An amorphous phase forms at concentrations of 15--18 at.% Ti and 22 at.% C, while a two-phase alloy (amorphous + fcc Ni) forms for {le} 16 at.% C. Electroformed layers with sub-micron fcc grains of Ni or Ni{sub 80}Fe{sub 20} were also found to be amorphized by Ti + C implantation, a key requirement for applying this treatment to Ni-based micro-electromechanical systems to reduce their friction and wear.},
doi = {},
url = {https://www.osti.gov/biblio/548627}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon Oct 13 00:00:00 EDT 1997},
month = {Mon Oct 13 00:00:00 EDT 1997}
}

Conference:
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