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Title: Advanced X-ray/EUV radiation sources and applications; Proceedings of the Meeting, San Diego, CA, July 11-13, 1990

Conference ·
OSTI ID:5463292
;  [1]
  1. Rochester, University, NY (United States) Argonne National Laboratory, IL (United States)

Consideration is given to insertion device sources and synchrotron facilities, insertion device power, time-resolved techniques, polarization phenomena and novel optics, and new applications and detectors. Particular attention is given to the status of the Advanced Light Source and the Advanced Photon Source, power distribution from insertion device X-ray sources, filter and window assemblies for high-power insertion device synchrotron radiation sources, techniques for production and analysis of polarized synchrotron radiation, a finite thickness effect of a zone plate on focusing hard X-rays, broadband multilayer coated blazed grating for X-ray wavelengths below 0.6 nm, soft and hard X-ray reflectivities of multilayers fabricated by alternating-material sputter deposition, X-ray holography for sequencing DNA, development of a synchrotron CCD-based area detector for structural biology, and design and fabrication of X-ray/EUV optics for photoemission experimental beam line.

OSTI ID:
5463292
Report Number(s):
CONF-9007157-
Resource Relation:
Conference: Society of Photo-Optical Instrumentation Engineers (SPIE) conference on EUV x-ray and gamma-ray instrumentation for astronomy, San Diego, CA (United States), 8-13 Jul 1990; Other Information: Meeting Sponsored by SPIE
Country of Publication:
United States
Language:
English