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Title: Process for measuring degradation of sulfur hexafluoride in high voltage systems

Patent ·
OSTI ID:5455493

This invention is a method of detecting the presence of toxic and corrosive by-products in high voltage systems produced by electrically induced degradation of SF/sub 6/ insulating gas in the presence of certain impurities. It is an improvement over previous methods because it is extremely sensitive, detecting by-products present in parts per billion concentrations, and because the device employed is of a simple design and takes advantage of the by-products natural affinity for fluoride ions. The method employs an ion-molecule reaction cell in which negative ions of the by-products are produced by fluorine attachment. These ions are admitted to a negative ion mass spectrometer and identified by their spectra. This spectrometry technique is an improvement over conventional techniques because the negative ion peaks are strong and not obscured by a major ion spectra of the SF/sub 6/ component as is the case in positive ion mass spectrometry.

Research Organization:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
DOE Contract Number:
AC05-84OR21400
Assignee:
Dept. of Energy
Application Number:
ON: DE86013808
OSTI ID:
5455493
Country of Publication:
United States
Language:
English