Chemical kinetics in low pressure acetylene radio frequency glow discharges
- Department of Physics and Astronomy, Macalester College, St. Paul, Minnesota 55105 (United States)
The product gas yields for a 30 mTorr C{sub 2}H{sub 2} 13.56 MHz glow discharge were measured using mass spectrometry. The volatile products are H{sub 2}, C{sub 4}H{sub 2}, and C{sub 6}H{sub 2}. A reaction mechanism has been proposed that accounts quantitatively for the yields of C{sub 4}H{sub 2} and C{sub 6}H{sub 2}, and film deposition rate, as a function of discharge power. The product gases C{sub 4}H{sub 2} and C{sub 6}H{sub 2} are depleted at high rates in the plasma by electron collisional dissociation, and by reaction with H atoms and C{sub 2}H radicals. Under high power conditions suitable for diamondlike carbon deposition it is proposed that the film growth is dominated by the radicals C{sub 4}H{sub 3}, C{sub 6}H{sub 3}, and C{sub 2}H. These results are compared with the kinetics of methane rf glow discharges under similar conditions. {copyright} {ital 1997 American Institute of Physics.}
- OSTI ID:
- 544780
- Journal Information:
- Journal of Applied Physics, Vol. 82, Issue 10; Other Information: PBD: Nov 1997
- Country of Publication:
- United States
- Language:
- English
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