Stability of electron emission current in hydrogen-free diamond-like carbon deposited by plasma enhanced chemical vapor deposition

Journal Article · Wed Oct 01 00:00:00 EDT 1997 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.366286· OSTI ID:542568

Chung, S J; Moon, J H; Park, K C ^[1]; Oh, M H ^[2]; Milne, W I ^[3]; Jang, J ^[1]

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1. Department of Physics, Kyung Hee University, Dongdaemoon-ku, Seoul 130-701 (Korea)
2. Korea Institute of Science and Technology, P.O. Box 131 (Korea)
3. University of Cambridge, Trumpington Street, Cambridge CB2 1PZ (United Kingdom)

We have studied the electron emission characteristics of the hydrogen-free diamondlike carbon (DLC) and conventional DLC films. The electron emission current of conventional DLC increases at first and then decreases continuously with bias stress time. The emission current of the hydrogen-free DLC, deposited by the layer-by-layer technique, increases at first and then stabilizes with increasing stress time. The resistivity of the hydrogen-free DLC decreases after long bias stress, and that appears to be due to the changes in the density of states in the gap of the hydrogen-free DLC. {copyright} {ital 1997 American Institute of Physics.}

• OSTI ID: 542568
• Journal Information: Journal of Applied Physics, Vol. 82, Issue 8; Other Information: PBD: Oct 1997
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CARBON
ELECTRON EMISSION
ELECTRIC CONDUCTIVITY
CHEMICAL VAPOR DEPOSITION
THIN FILMS
STABILITY
STRESSES
ENERGY GAP