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Title: Plasma-assisted etching of tungsten films: A quartz-crystal microbalance study

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.339915· OSTI ID:5419677
;

The plasma-assisted etching of magnetron-sputtered polycrystalline tungsten films in CF/sub 4/-H/sub 2/ and CF/sub 4/-O/sub 2/ glow discharges has been studied as a function of ion energy using quartz-crystal microbalance methods supplemented by vacuum-transfer Auger electron spectroscopy and actinometric emission spectroscopy.

Research Organization:
IBM Almaden Research Center, 650 Harry Road, San Jose, California 95120-6099
OSTI ID:
5419677
Journal Information:
J. Appl. Phys.; (United States), Vol. 63:5
Country of Publication:
United States
Language:
English

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Related Subjects

36 MATERIALS SCIENCE
CARBON FLUORIDES
COLLISIONS
HYDROGEN
OXYGEN
TUNGSTEN
ETCHING
ION COLLISIONS
MOLECULE COLLISIONS
GLOW DISCHARGES
PLASMA
TUNGSTEN FLUORIDES
CARBON COMPOUNDS
ELECTRIC DISCHARGES
ELEMENTS
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
METALS
NONMETALS
REFRACTORY METAL COMPOUNDS
SURFACE FINISHING
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TUNGSTEN COMPOUNDS
360101* - Metals & Alloys- Preparation & Fabrication