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Title: Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists

Abstract

Photoresist techniques and compositions are provided employing curcumin as an absorptive dye for the purpose of reducing linewidth non-uniformity caused by scattered and reflective light from the substrate-resist interface. The photoresist compositions containing curcumin as the absorptive dye are used in the production of microelectronic circuitry by both single layer and multilayer photoresist techniques. 2 figs.

Inventors:
Publication Date:
Research Org.:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Org.:
USDOE; USDOE, Washington, DC (United States)
OSTI Identifier:
5409799
Patent Number(s):
PATENTS-US-A7258543
Application Number:
ON: DE91016973; PPN: US 7-258543
Assignee:
Dept. of Energy
DOE Contract Number:  
AC04-76DP00789
Resource Type:
Patent Application
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; DYES; ABSORPTIVITY; CURCUMIN; ETCHING; INVENTIONS; MICROELECTRONIC CIRCUITS; PHOTORESISTORS; RESINS; AROMATICS; ELECTRICAL EQUIPMENT; ELECTRONIC CIRCUITS; EQUIPMENT; ETHERS; HYDROXY COMPOUNDS; KETONES; OPTICAL PROPERTIES; ORGANIC COMPOUNDS; ORGANIC OXYGEN COMPOUNDS; ORGANIC POLYMERS; PETROCHEMICALS; PETROLEUM PRODUCTS; PHENOLS; PHYSICAL PROPERTIES; POLYMERS; POLYPHENOLS; RESISTORS; SURFACE FINISHING; 360603* - Materials- Properties; 426000 - Engineering- Components, Electron Devices & Circuits- (1990-)

Citation Formats

Renschler, C L. Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists. United States: N. p., 1988. Web.
Renschler, C L. Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists. United States.
Renschler, C L. 1988. "Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists". United States.
@article{osti_5409799,
title = {Phenolic dyes as nonbleachable absorbers compatible with novolac resins for linewidth control in photoresists},
author = {Renschler, C L},
abstractNote = {Photoresist techniques and compositions are provided employing curcumin as an absorptive dye for the purpose of reducing linewidth non-uniformity caused by scattered and reflective light from the substrate-resist interface. The photoresist compositions containing curcumin as the absorptive dye are used in the production of microelectronic circuitry by both single layer and multilayer photoresist techniques. 2 figs.},
doi = {},
url = {https://www.osti.gov/biblio/5409799}, journal = {},
number = ,
volume = ,
place = {United States},
year = {1988},
month = {10}
}