Profile control of polysilicon lines with an SF/sub 6//O/sub 2/ plasma etch process
Journal Article
·
· J. Electrochem. Soc.; (United States)
Typical plasma etching techniques used in integrated circuit fabrication can generate steep topographies that cannot be covered adequately by subsequent deposition steps. An SF/sub 6//O/sub 2/ plasma etching process for polysilicon using controlled photoresist erosion produces tapered edge profiles compatible with step coverage requirements. The degree of taper is a function of the photoresist profile, the photoresist to polysilicon etch rate ratio, and the extent of overetch. The photoresist and the polysilicon appear to etch predominantly anisotropically with the isotropic component of the polysilicon etch rate increasing during the overetch period.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- DOE Contract Number:
- AC04-76DP00789
- OSTI ID:
- 5397558
- Journal Information:
- J. Electrochem. Soc.; (United States), Vol. 130:7
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
42 ENGINEERING
36 MATERIALS SCIENCE
INTEGRATED CIRCUITS
ETCHING
FABRICATION
SILICON
ANISOTROPY
DEPOSITION
EROSION
ISOTROPY
OXYGEN
PHOTORESISTORS
PLASMA
SULFUR DIOXIDE
SULFUR FLUORIDES
TOPOGRAPHY
CHALCOGENIDES
ELECTRICAL EQUIPMENT
ELECTRONIC CIRCUITS
ELEMENTS
EQUIPMENT
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
MICROELECTRONIC CIRCUITS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
RESISTORS
SEMIMETALS
SULFUR COMPOUNDS
SULFUR OXIDES
SURFACE FINISHING
420800* - Engineering- Electronic Circuits & Devices- (-1989)
360601 - Other Materials- Preparation & Manufacture
36 MATERIALS SCIENCE
INTEGRATED CIRCUITS
ETCHING
FABRICATION
SILICON
ANISOTROPY
DEPOSITION
EROSION
ISOTROPY
OXYGEN
PHOTORESISTORS
PLASMA
SULFUR DIOXIDE
SULFUR FLUORIDES
TOPOGRAPHY
CHALCOGENIDES
ELECTRICAL EQUIPMENT
ELECTRONIC CIRCUITS
ELEMENTS
EQUIPMENT
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
MICROELECTRONIC CIRCUITS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
RESISTORS
SEMIMETALS
SULFUR COMPOUNDS
SULFUR OXIDES
SURFACE FINISHING
420800* - Engineering- Electronic Circuits & Devices- (-1989)
360601 - Other Materials- Preparation & Manufacture