Method for producing high quality oxide films on substrates

Patent · 23 November 1993

OSTI ID:5364578

Ruckman, M W; Strongin, M; Gao, Y L

A method is described for providing an oxide film of a material on the surface of a substrate using a reactive deposition of the material onto the substrate surface in the presence of a solid or liquid layer of an oxidizing gas. The oxidizing gas is provided on the substrate surface in an amount sufficient to dissipate the latent heat of condensation occurring during deposition as well as creating a favorable oxidizing environment for the material. 4 figures.

• DOE Contract Number: AC02-76CH00016
• Assignee: Associated Universities, Inc., Washington, DC (United States)
• Patent Number(s): US 5264394; A
• Application Number: PPN: US 7-704097
• OSTI ID: 5364578
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COMPOSITE MATERIALS
DEPOSITION
ENTHALPY
FABRICATION
FILMS
FORMATION HEAT
MATERIALS
OXIDES
OXIDIZERS
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
REACTION HEAT
SURFACE COATING
THERMODYNAMIC PROPERTIES
THIN FILMS