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Title: Development and fabrication of a solar cell junction processing system. Quarterly report No. 2, July 1980

Technical Report ·
DOI:https://doi.org/10.2172/5356699· OSTI ID:5356699

The basic objectives of the program are the following: (1) to design, develop, construct and deliver a junction processing system which will be capable of producing solar cell junctions by means of ion implantation followed by pulsed electron beam annealing; (2) to include in the system a wafer transport mechanism capable of transferring 4-inch-diameter wafers into and out of the vacuum chamber where the ion implantation and pulsed electron beam annealing processes take place; (3) to integrate, test and demonstrate the system prior to its delivery to JPL along with detailed operating and maintenance manuals; and (4) to estimate component lifetimes and costs, as necessary for the contract, for the performance of comprehensive analyses in accordance with the Solar Array Manufacturing Industry Costing Standards (SAMICS). Under this contract the automated junction formation equipment to be developed involves a new system design incorporating a modified, government-owned, JPL-controlled ion implanter into a Spire-developed pulsed electron beam annealer and wafer transport system. When modified, the ion implanter will deliver a 16 mA beam of /sup 31/P/sup +/ ions with a fluence of 2.5 x 10/sup 15/ ions per square centimeter at an energy of 10 keV. The throughput design goal rate for the junction processor is 10/sup 7/ four-inch-diameter wafers per year.

Research Organization:
California Institute of Technology (CalTech), Pasadena, CA (United States). Jet Propulsion Lab. (JPL)
DOE Contract Number:
NAS-7-100-955640
OSTI ID:
5356699
Report Number(s):
DOE/JPL/955640-80/2
Country of Publication:
United States
Language:
English