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Title: Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing

Abstract

The surface wave produced plasma belongs to a class of RF and microwave induced plasmas. It results from the propagation of an electromagnetic wave which uses the plasma column it sustains and the plasma tube as its sole propagating media. This type of plasma offers several advantages compared to the positive column plasma of dc discharges or to other RF and microwave produced plasmas. Surface wave plasmas require no internal electrodes and they can be applied over an extremely broad range of wave frequencies and gas pressures. Using the surface wave plasma technique, a large variety of plasma column diameters have been created, and no limitation on plasma column length has been found. The surface wave produced plasma is used in elemental analysis and to sustain emission in lasing media. This article is intended as a guide for potential users of surface wave plasmas in the field of plasma processing and plasma chemistry.

Authors:
; ;
Publication Date:
Research Org.:
Univ. de Montreal, Quebec
OSTI Identifier:
5345788
Resource Type:
Journal Article
Journal Name:
Plasma Chem. Plasma Process.; (United States)
Additional Journal Information:
Journal Volume: 6:1
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; PLASMA; USES; PLASMA PRODUCTION; HIGH-FREQUENCY DISCHARGES; REVIEWS; PLASMA WAVES; WAVE PROPAGATION; ARGON; ELECTROMAGNETIC FIELDS; ELECTRON DENSITY; ELECTRON TEMPERATURE; ETCHING; ION SOURCES; IONIZATION; LASER MATERIALS; MICROWAVE RADIATION; PLASMA ARC SPRAYING; RADIOWAVE RADIATION; DEPOSITION; DOCUMENT TYPES; ELECTRIC DISCHARGES; ELECTROMAGNETIC RADIATION; ELEMENTS; FLUIDS; GASES; MATERIALS; NONMETALS; RADIATIONS; RARE GASES; SPRAY COATING; SURFACE COATING; SURFACE FINISHING; 400201* - Chemical & Physicochemical Properties; 400301 - Organic Chemistry- Chemical & Physicochemical Properties- (-1987)

Citation Formats

Chaker, M., Moisan, M., and Zakrzewski, Z. Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing. United States: N. p., 1986. Web. doi:10.1007/BF00573823.
Chaker, M., Moisan, M., & Zakrzewski, Z. Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing. United States. doi:10.1007/BF00573823.
Chaker, M., Moisan, M., and Zakrzewski, Z. Sat . "Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing". United States. doi:10.1007/BF00573823.
@article{osti_5345788,
title = {Microwave and RF surface wave sustained discharges as plasma sources for plasma chemistry and plasma processing},
author = {Chaker, M. and Moisan, M. and Zakrzewski, Z.},
abstractNote = {The surface wave produced plasma belongs to a class of RF and microwave induced plasmas. It results from the propagation of an electromagnetic wave which uses the plasma column it sustains and the plasma tube as its sole propagating media. This type of plasma offers several advantages compared to the positive column plasma of dc discharges or to other RF and microwave produced plasmas. Surface wave plasmas require no internal electrodes and they can be applied over an extremely broad range of wave frequencies and gas pressures. Using the surface wave plasma technique, a large variety of plasma column diameters have been created, and no limitation on plasma column length has been found. The surface wave produced plasma is used in elemental analysis and to sustain emission in lasing media. This article is intended as a guide for potential users of surface wave plasmas in the field of plasma processing and plasma chemistry.},
doi = {10.1007/BF00573823},
journal = {Plasma Chem. Plasma Process.; (United States)},
number = ,
volume = 6:1,
place = {United States},
year = {1986},
month = {3}
}