skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Adsorption and photodecomposition of Mo(CO)[sub 6] on Si(111) 7[times]7: An infrared reflection absorption spectroscopy study

Abstract

The adsorption and photodecomposition of Mo(CO)[sub 6] adsorbed on Si(111) 7[times]7 surfaces has been studied with Auger electron spectroscopy, temperature programmed desorption, low energy electron diffraction and infrared reflection absorption spectroscopy in a single external reflection configuration. The external-reflection technique is demonstrated to have adequate sensitivity to characterize submonolayer coverages of photogenerated Mo(CO)[sub [ital x]] fragments. It is proposed that the first layer of Mo(CO)[sub 6] adsorbs in ordered islands with a Mo(CO)[sub 6] atop each adatom of the 7[times]7 reconstructed Si surface. UV irradiation of these islands produces a carbonyl fragment, identified as chemisorbed Mo(CO)[sub 5]. The Mo(CO)[sub 5] thermally decarbonylates via two subcarbonyl intermediates with little CO dissociation. Photolysis of thicker layers results in the formation of Mo[sub [ital x]](CO)[sub [ital y]] dimers/polymers, as evidenced by the appearance of bridging CO, which is attributed to a facile association reaction. The dimer/polymer species correlate with deposition of C and O on the surface.

Authors:
; ; ;  [1]
  1. (Surface and Microanalysis Science Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States))
Publication Date:
OSTI Identifier:
5343570
DOE Contract Number:  
AI05-84ER13150
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Chemical Physics; (United States); Journal Volume: 100:4
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; CARBONYLS; ADSORPTION; MOLYBDENUM COMPOUNDS; SILICON; SORPTIVE PROPERTIES; ABSORPTION SPECTROSCOPY; AUGER ELECTRON SPECTROSCOPY; DECOMPOSITION; DESORPTION; ELECTRON DIFFRACTION; INFRARED SPECTRA; PHOTOCHEMICAL REACTIONS; ULTRAVIOLET RADIATION; CHEMICAL REACTIONS; COHERENT SCATTERING; DIFFRACTION; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ELEMENTS; RADIATIONS; REFRACTORY METAL COMPOUNDS; SCATTERING; SEMIMETALS; SORPTION; SPECTRA; SPECTROSCOPY; SURFACE PROPERTIES; TRANSITION ELEMENT COMPOUNDS; 400500* - Photochemistry

Citation Formats

Richter, L.J., Buntin, S.A., Chu, P.M., and Cavanagh, R.R.. Adsorption and photodecomposition of Mo(CO)[sub 6] on Si(111) 7[times]7: An infrared reflection absorption spectroscopy study. United States: N. p., 1994. Web. doi:10.1063/1.466410.
Richter, L.J., Buntin, S.A., Chu, P.M., & Cavanagh, R.R.. Adsorption and photodecomposition of Mo(CO)[sub 6] on Si(111) 7[times]7: An infrared reflection absorption spectroscopy study. United States. doi:10.1063/1.466410.
Richter, L.J., Buntin, S.A., Chu, P.M., and Cavanagh, R.R.. Tue . "Adsorption and photodecomposition of Mo(CO)[sub 6] on Si(111) 7[times]7: An infrared reflection absorption spectroscopy study". United States. doi:10.1063/1.466410.
@article{osti_5343570,
title = {Adsorption and photodecomposition of Mo(CO)[sub 6] on Si(111) 7[times]7: An infrared reflection absorption spectroscopy study},
author = {Richter, L.J. and Buntin, S.A. and Chu, P.M. and Cavanagh, R.R.},
abstractNote = {The adsorption and photodecomposition of Mo(CO)[sub 6] adsorbed on Si(111) 7[times]7 surfaces has been studied with Auger electron spectroscopy, temperature programmed desorption, low energy electron diffraction and infrared reflection absorption spectroscopy in a single external reflection configuration. The external-reflection technique is demonstrated to have adequate sensitivity to characterize submonolayer coverages of photogenerated Mo(CO)[sub [ital x]] fragments. It is proposed that the first layer of Mo(CO)[sub 6] adsorbs in ordered islands with a Mo(CO)[sub 6] atop each adatom of the 7[times]7 reconstructed Si surface. UV irradiation of these islands produces a carbonyl fragment, identified as chemisorbed Mo(CO)[sub 5]. The Mo(CO)[sub 5] thermally decarbonylates via two subcarbonyl intermediates with little CO dissociation. Photolysis of thicker layers results in the formation of Mo[sub [ital x]](CO)[sub [ital y]] dimers/polymers, as evidenced by the appearance of bridging CO, which is attributed to a facile association reaction. The dimer/polymer species correlate with deposition of C and O on the surface.},
doi = {10.1063/1.466410},
journal = {Journal of Chemical Physics; (United States)},
number = ,
volume = 100:4,
place = {United States},
year = {Tue Feb 15 00:00:00 EST 1994},
month = {Tue Feb 15 00:00:00 EST 1994}
}