skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Adsorption and photodecomposition of Mo(CO)[sub 6] on Si(111) 7[times]7: An infrared reflection absorption spectroscopy study

Journal Article · · Journal of Chemical Physics; (United States)
DOI:https://doi.org/10.1063/1.466410· OSTI ID:5343570
; ; ;  [1]
  1. Surface and Microanalysis Science Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (United States)

The adsorption and photodecomposition of Mo(CO)[sub 6] adsorbed on Si(111) 7[times]7 surfaces has been studied with Auger electron spectroscopy, temperature programmed desorption, low energy electron diffraction and infrared reflection absorption spectroscopy in a single external reflection configuration. The external-reflection technique is demonstrated to have adequate sensitivity to characterize submonolayer coverages of photogenerated Mo(CO)[sub [ital x]] fragments. It is proposed that the first layer of Mo(CO)[sub 6] adsorbs in ordered islands with a Mo(CO)[sub 6] atop each adatom of the 7[times]7 reconstructed Si surface. UV irradiation of these islands produces a carbonyl fragment, identified as chemisorbed Mo(CO)[sub 5]. The Mo(CO)[sub 5] thermally decarbonylates via two subcarbonyl intermediates with little CO dissociation. Photolysis of thicker layers results in the formation of Mo[sub [ital x]](CO)[sub [ital y]] dimers/polymers, as evidenced by the appearance of bridging CO, which is attributed to a facile association reaction. The dimer/polymer species correlate with deposition of C and O on the surface.

DOE Contract Number:
AI05-84ER13150
OSTI ID:
5343570
Journal Information:
Journal of Chemical Physics; (United States), Vol. 100:4; ISSN 0021-9606
Country of Publication:
United States
Language:
English