Formation and thermal stability of amorphous Cu-Zr thin films deposited by coevaporation
The formation and thermal stability of amorphous thin films have been characterized by comparing them with those of melt-spun ribbons. The various Cu/sub 1-//sub x/Zr/sub x/ thin films were deposited by coevaporation. The amorphous formation range and the crystallization behavior in the films were investigated with x-ray diffraction and differential scanning calorimetry. The amorphous thin films are formed in the composition range x = 0.20--0.75, which is wider than that found for the melt-spun ribbons. The crystallization temperature and the activation energy for crystallization are lower than those of the melt-spun ribbons, although the composition dependencies show tendencies similar to those of the ribbons. These differences in thermal stability between amorphous films and ribbons might be due to a lower degree of the short-range ordering in the films.
- Research Organization:
- Philips Research Laboratories, P. O. Box 80 000, 5600 JA Eindhoven, The Netherlands
- OSTI ID:
- 5329836
- Journal Information:
- J. Appl. Phys.; (United States), Vol. 63:9
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
COPPER ALLOYS
CRYSTALLIZATION
STABILITY
VACUUM COATING
ZIRCONIUM ALLOYS
AMORPHOUS STATE
CHEMICAL COMPOSITION
DEPOSITION
THIN FILMS
VACUUM EVAPORATION
X-RAY DIFFRACTION
ALLOYS
COHERENT SCATTERING
DIFFRACTION
EVAPORATION
FILMS
PHASE TRANSFORMATIONS
SCATTERING
SURFACE COATING
360101* - Metals & Alloys- Preparation & Fabrication
360102 - Metals & Alloys- Structure & Phase Studies