Extended energy loss fine structure analysis of hard and elastic carbon nitride thin films

Journal Article · Tue Jul 01 00:00:00 EDT 1997 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.365596· OSTI ID:531738

Csillag, S; Raety, R; Zou, W Y ^[1]; Sjoestroem, H; Sundgren, J ^[2]; Colliex, C ^[3]

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1. Stockholm University, Department of Physics, Box 6730, S-113 85 Stockholm (Sweden)
2. Thin Film Division, Department of Physics, Linkoeping University, S-581 83 Linkoeping (Sweden)
3. Laboratoire Physique des Solides, Bat. 510, Universite Paris-Sud, 91405 Orsay (France)

In this article an electron energy loss spectroscopy investigation of CN{sub x} thin films is reported. The bonding, composition, and structure are discussed and a more thorough extended energy loss spectroscopy investigation is carried out to determine the interatomic distances. The extended energy loss fine structure analysis reveals a component with an unusually high frequency in the data corresponding to an interatomic distance of approximately 7.3 {Angstrom}. This is suggested to originate from backscattering from distant curved atomic layers. {copyright} {ital 1997 American Institute of Physics.}

• OSTI ID: 531738
• Journal Information: Journal of Applied Physics, Vol. 82, Issue 2; Other Information: PBD: Jul 1997
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CARBON NITRIDES
STRUCTURAL CHEMICAL ANALYSIS
CARBON COMPOUNDS
PROTECTIVE COATINGS
THIN FILMS
INTERATOMIC DISTANCES
BONDING
CHEMICAL COMPOSITION
SPUTTERING
MICROSTRUCTURE