Direct atomic flux measurement of electron-beam evaporated yttrium with a diode-laser-based atomic absorption monitor at 668 nm

Journal Article · Tue Jul 01 00:00:00 EDT 1997 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.119460· OSTI ID:531701

Wang, W; Hammond, R H; Fejer, M M; Arnason, S; Beasley, M R ^[1]; Bortz, M L; Day, T ^[2]

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1. Edward L. Ginzton Laboratory, Stanford University, Stanford, California 94305 (United States)
2. Focused Research, Inc., Santa Clara, California 95051 (United States)

A direct measurement of atomic flux in {ital e}-beam evaporated yttrium has been demonstrated with a diode-laser-based atomic absorption (AA) monitor at 668 nm. Atomic number density and velocity were measured through absorption and Doppler shift measurements to provide the atomic flux. The AA-based deposition rates were compared with independent quartz crystal monitors showing agreement between the two methods. {copyright} {ital 1997 American Institute of Physics.}

• OSTI ID: 531701
• Journal Information: Applied Physics Letters, Vol. 71, Issue 1; Other Information: PBD: Jul 1997
• Country of Publication: United States
• Language: English

Related Subjects

66 PHYSICS
36 MATERIALS SCIENCE
YTTRIUM
PHYSICAL VAPOR DEPOSITION
FLUX DENSITY
VISIBLE SPECTRA
ELECTRON BEAMS
EVAPORATION
VELOCITY
MONITORING