Electron beam induced decomposition of cadmium chloride thin films with potential resist application
The radiolysis of vacuum-deposited thin films of cadmium chloride on silicon substrates has been studied in the energy range from 1 to 5 keV. Phase-locked mass spectrometry was used for the in situ monitoring of the evolution of the decomposition products, chlorine and cadmium, as a function of substrate temperature, current density, film thickness, and beam energy, for pure and doped films. Ellipsometric thickness and refractive index measurements, and scanning electron microscope examination of the morphology of irradiated films were carried out. The decomposition kinetics have been analyzed in terms of a model in which a fraction of the radiation-generated electron-hole pairs participate in the thermally activated decomposition reaction sequence at the film surface. A potential lithographic scheme has been established, in which decomposition patterns generated onto the films are transferred onto the SiO/sub 2/ underlayer by reactive ion etching, with a resolution approximately equal to the film grain size.
- Research Organization:
- Department of Electrical Engineering, Imperial College of Science and Technology, London SW7 2BT, United Kingdom
- OSTI ID:
- 5278328
- Journal Information:
- J. Appl. Phys.; (United States), Vol. 63:9
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CADMIUM CHLORIDES
RADIOLYSIS
CRYSTAL DOPING
DECOMPOSITION
DOPED MATERIALS
ETCHING
GRAIN SIZE
KEV RANGE 01-10
KINETICS
REFRACTIVITY
SCANNING ELECTRON MICROSCOPY
SILICA
THICKNESS
THIN FILMS
CADMIUM COMPOUNDS
CADMIUM HALIDES
CHALCOGENIDES
CHEMICAL RADIATION EFFECTS
CHEMICAL REACTIONS
CHEMISTRY
CHLORIDES
CHLORINE COMPOUNDS
CRYSTAL STRUCTURE
DIMENSIONS
ELECTRON MICROSCOPY
ENERGY RANGE
FILMS
HALIDES
HALOGEN COMPOUNDS
KEV RANGE
MATERIALS
MICROSCOPY
MICROSTRUCTURE
MINERALS
OPTICAL PROPERTIES
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
RADIATION CHEMISTRY
RADIATION EFFECTS
SILICON COMPOUNDS
SILICON OXIDES
SIZE
SURFACE FINISHING
360605* - Materials- Radiation Effects