Development of XRMF techniques for measurement of multi-layer film thicknesses on semiconductors for VLSI and ULSI integrated circuits. Final CRADA report for CRADA number Y-1292-0130

Technical Report · Mon Feb 03 00:00:00 EST 1997

DOI:https://doi.org/10.2172/527526· OSTI ID:527526

Carpenter, D A ^[1]; Golijanin, D L; Wherry, D ^[2]

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1. Lockheed Martin Energy Systems, Inc., Oak Ridge, TN (United States)
2. Kevex Instruments, Valencia, CA (United States)

A CRADA with Kevex Instruments was carried out to develop improved XRMF instrumentation for the nondestructive analysis of electronic components during manufacture. Experiments conducted at Y-12 proved the feasibility of a new Kevex x-ray tube design. Tests also show that the current commercial supply of straight glass capillaries is unreliable; however, other vendors of tapered single and multiple glass capillaries were identified. The stability of the Y-12 x-ray microprobe was significantly enhanced as a result of this CRADA.

• Research Organization: Oak Ridge Y-12 Plant (Y-12), Oak Ridge, TN (United States)
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: AC05-84OS21400
• OSTI ID: 527526
• Report Number(s): Y/AMT-454; ON: DE97008830; CRN: C/Y-12--92-0130; TRN: 97:018520
• Resource Relation: Other Information: PBD: 3 Feb 1997
• Country of Publication: United States
• Language: English

Related Subjects

40 CHEMISTRY
42 ENGINEERING NOT INCLUDED IN OTHER CATEGORIES
X-RAY FLUORESCENCE ANALYSIS
INTEGRATED CIRCUITS
PROGRESS REPORT
X-RAY FLUORESCENCE ANALYZERS
NONDESTRUCTIVE ANALYSIS
MANUFACTURING
X-RAY TUBES
MICROANALYSIS
THICKNESS