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Title: Random telegraph signals in small gate-area p-MOS transistors

Conference · · AIP Conference Proceedings (American Institute of Physics); (United States)
DOI:https://doi.org/10.1063/1.44673· OSTI ID:5258039
;  [1];  [2]
  1. Department of Physics, Oberlin College, Oberlin, Ohio 44074 (United States)
  2. Sandia National Laboratories, Dept. 1332, Albuquerque, New Mexico 87185-5800 (United States)

We report the observation of random telegraph signals (RTS) in the channel resistances of nominally 1.25 [mu]m[times]1.25 [mu]m, enhancement-mode pMOS transistors fabricated using the AT T 1-[mu]m radiation hardened technology. Devices were operated in strong inversion in the linear regime. Measurements, performed for temperatures ranging from 77 to 300 K and various gate voltages, show that capture and emission times are both thermally activated and that the capture time depends strongly on the gate voltage. Results suggest that the unfilled trap is charged and that, after capturing a hole, the trap relaxes to a lower energy. Basic features of a model are discussed.

DOE Contract Number:
AC04-76DP00789
OSTI ID:
5258039
Report Number(s):
CONF-930866-; CODEN: APCPCS; TRN: 94-005384
Journal Information:
AIP Conference Proceedings (American Institute of Physics); (United States), Vol. 285:1; Conference: 12. international conference on noise in physical systems and 1/f fluctuations, St. Louis, MO (United States), 16-20 Aug 1993; ISSN 0094-243X
Country of Publication:
United States
Language:
English